Abstract
To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.
| Original language | English |
|---|---|
| Title of host publication | TENCON 2010 - 2010 IEEE Region 10 Conference |
| Pages | 2213-2215 |
| Number of pages | 3 |
| DOIs | |
| Publication status | Published - Dec 1 2010 |
| Event | 2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan Duration: Nov 21 2010 → Nov 24 2010 |
Publication series
| Name | IEEE Region 10 Annual International Conference, Proceedings/TENCON |
|---|
Other
| Other | 2010 IEEE Region 10 Conference, TENCON 2010 |
|---|---|
| Country | Japan |
| City | Fukuoka |
| Period | 11/21/10 → 11/24/10 |
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All Science Journal Classification (ASJC) codes
- Computer Science Applications
- Electrical and Electronic Engineering
Cite this
Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches. / Nomura, Takuya; Urakawa, Tatsuya; Korenaga, Yuki; Yamashita, Daisuke; Matsuzaki, Hidefumi; Koga, Kazunori; Shiratani, Masaharu; Setsuhara, Yuichi; Sekine, Makoto; Hori, Masaru.
TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 2213-2215 5686688 (IEEE Region 10 Annual International Conference, Proceedings/TENCON).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
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TY - GEN
T1 - Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches
AU - Nomura, Takuya
AU - Urakawa, Tatsuya
AU - Korenaga, Yuki
AU - Yamashita, Daisuke
AU - Matsuzaki, Hidefumi
AU - Koga, Kazunori
AU - Shiratani, Masaharu
AU - Setsuhara, Yuichi
AU - Sekine, Makoto
AU - Hori, Masaru
PY - 2010/12/1
Y1 - 2010/12/1
N2 - To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.
AB - To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.
UR - http://www.scopus.com/inward/record.url?scp=79951652835&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79951652835&partnerID=8YFLogxK
U2 - 10.1109/TENCON.2010.5686688
DO - 10.1109/TENCON.2010.5686688
M3 - Conference contribution
AN - SCOPUS:79951652835
SN - 9781424468904
T3 - IEEE Region 10 Annual International Conference, Proceedings/TENCON
SP - 2213
EP - 2215
BT - TENCON 2010 - 2010 IEEE Region 10 Conference
ER -