TY - GEN
T1 - Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches
AU - Nomura, Takuya
AU - Urakawa, Tatsuya
AU - Korenaga, Yuki
AU - Yamashita, Daisuke
AU - Matsuzaki, Hidefumi
AU - Koga, Kazunori
AU - Shiratani, Masaharu
AU - Setsuhara, Yuichi
AU - Sekine, Makoto
AU - Hori, Masaru
PY - 2010/12/1
Y1 - 2010/12/1
N2 - To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.
AB - To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.
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UR - http://www.scopus.com/inward/citedby.url?scp=79951652835&partnerID=8YFLogxK
U2 - 10.1109/TENCON.2010.5686688
DO - 10.1109/TENCON.2010.5686688
M3 - Conference contribution
AN - SCOPUS:79951652835
SN - 9781424468904
T3 - IEEE Region 10 Annual International Conference, Proceedings/TENCON
SP - 2213
EP - 2215
BT - TENCON 2010 - 2010 IEEE Region 10 Conference
T2 - 2010 IEEE Region 10 Conference, TENCON 2010
Y2 - 21 November 2010 through 24 November 2010
ER -