Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches

Takuya Nomura, Tatsuya Urakawa, Yuki Korenaga, Daisuke Yamashita, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.

Original languageEnglish
Title of host publicationTENCON 2010 - 2010 IEEE Region 10 Conference
Pages2213-2215
Number of pages3
DOIs
Publication statusPublished - Dec 1 2010
Event2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan
Duration: Nov 21 2010Nov 24 2010

Publication series

NameIEEE Region 10 Annual International Conference, Proceedings/TENCON

Other

Other2010 IEEE Region 10 Conference, TENCON 2010
CountryJapan
CityFukuoka
Period11/21/1011/24/10

All Science Journal Classification (ASJC) codes

  • Computer Science Applications
  • Electrical and Electronic Engineering

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    Nomura, T., Urakawa, T., Korenaga, Y., Yamashita, D., Matsuzaki, H., Koga, K., Shiratani, M., Setsuhara, Y., Sekine, M., & Hori, M. (2010). Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches. In TENCON 2010 - 2010 IEEE Region 10 Conference (pp. 2213-2215). [5686688] (IEEE Region 10 Annual International Conference, Proceedings/TENCON). https://doi.org/10.1109/TENCON.2010.5686688