Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches

Takuya Nomura; Tatsuya Urakawa; Yuki Korenaga; Daisuke Yamashita; Hidefumi Matsuzaki; Kazunori Koga; Masaharu Shiratani; Yuichi Setsuhara; Makoto Sekine; Masaru Hori

doi:10.1109/TENCON.2010.5686688

Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches

Takuya Nomura, Tatsuya Urakawa, Yuki Korenaga, Daisuke Yamashita, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori

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Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H₂, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.

Original language	English
Title of host publication	TENCON 2010 - 2010 IEEE Region 10 Conference
Pages	2213-2215
Number of pages	3
DOIs	https://doi.org/10.1109/TENCON.2010.5686688
Publication status	Published - Dec 1 2010
Event	2010 IEEE Region 10 Conference, TENCON 2010 - Fukuoka, Japan Duration: Nov 21 2010 → Nov 24 2010

Publication series

Name	IEEE Region 10 Annual International Conference, Proceedings/TENCON

Other

Other	2010 IEEE Region 10 Conference, TENCON 2010
Country	Japan
City	Fukuoka
Period	11/21/10 → 11/24/10

All Science Journal Classification (ASJC) codes

Computer Science Applications
Electrical and Electronic Engineering

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10.1109/TENCON.2010.5686688

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Nomura, T., Urakawa, T., Korenaga, Y., Yamashita, D., Matsuzaki, H., Koga, K., Shiratani, M., Setsuhara, Y., Sekine, M., & Hori, M. (2010). Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches. In TENCON 2010 - 2010 IEEE Region 10 Conference (pp. 2213-2215). [5686688] (IEEE Region 10 Annual International Conference, Proceedings/TENCON). https://doi.org/10.1109/TENCON.2010.5686688

Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches. / Nomura, Takuya; Urakawa, Tatsuya; Korenaga, Yuki; Yamashita, Daisuke; Matsuzaki, Hidefumi; Koga, Kazunori ; Shiratani, Masaharu; Setsuhara, Yuichi; Sekine, Makoto; Hori, Masaru.

TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 2213-2215 5686688 (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Nomura, T, Urakawa, T, Korenaga, Y, Yamashita, D, Matsuzaki, H, Koga, K , Shiratani, M, Setsuhara, Y, Sekine, M & Hori, M 2010, Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches. in TENCON 2010 - 2010 IEEE Region 10 Conference., 5686688, IEEE Region 10 Annual International Conference, Proceedings/TENCON, pp. 2213-2215, 2010 IEEE Region 10 Conference, TENCON 2010, Fukuoka, Japan, 11/21/10. https://doi.org/10.1109/TENCON.2010.5686688

Nomura T, Urakawa T, Korenaga Y, Yamashita D, Matsuzaki H, Koga K et al. Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches. In TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. p. 2213-2215. 5686688. (IEEE Region 10 Annual International Conference, Proceedings/TENCON). https://doi.org/10.1109/TENCON.2010.5686688

Nomura, Takuya ; Urakawa, Tatsuya ; Korenaga, Yuki ; Yamashita, Daisuke ; Matsuzaki, Hidefumi ; Koga, Kazunori ; Shiratani, Masaharu ; Setsuhara, Yuichi ; Sekine, Makoto ; Hori, Masaru. / Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches. TENCON 2010 - 2010 IEEE Region 10 Conference. 2010. pp. 2213-2215 (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

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abstract = "To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.",

author = "Takuya Nomura and Tatsuya Urakawa and Yuki Korenaga and Daisuke Yamashita and Hidefumi Matsuzaki and Kazunori Koga and Masaharu Shiratani and Yuichi Setsuhara and Makoto Sekine and Masaru Hori",

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AU - Matsuzaki, Hidefumi

AU - Koga, Kazunori

AU - Shiratani, Masaharu

AU - Setsuhara, Yuichi

AU - Sekine, Makoto

AU - Hori, Masaru

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AB - To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.

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Substrate temperature dependence of feature profile of carbon films on substrate with submicron trenches

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