Super low-temperature formation of polycrystalline silicon films on plastic substrates by underwater laser annealing

Emi Machida, Masahiro Horita, Yasuaki Ishikawa, Yukiharu Uraoka, Tetsuo Okuyama, Hiroshi Ikenoue

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We succeeded in the super low-temperature crystallization to high-quality poly-Si films on plastic substrates by underwater laser annealing (WLA). WLA enhances the energy margin twice as high as that in laser annealing in air (LA). Moreover, the crystallinity of WLA poly-Si was much better than that of LA poly-Si.

Original languageEnglish
Title of host publicationSociety for Information Display - 19th International Display Workshops 2012, IDW/AD 2012
Pages251-254
Number of pages4
Volume1
Publication statusPublished - Dec 1 2012
Event19th International Display Workshops in Conjunction with Asia Display 2012, IDW/AD 2012 - Kyoto, Japan
Duration: Dec 4 2012Dec 7 2012

Other

Other19th International Display Workshops in Conjunction with Asia Display 2012, IDW/AD 2012
CountryJapan
CityKyoto
Period12/4/1212/7/12

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All Science Journal Classification (ASJC) codes

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

Cite this

Machida, E., Horita, M., Ishikawa, Y., Uraoka, Y., Okuyama, T., & Ikenoue, H. (2012). Super low-temperature formation of polycrystalline silicon films on plastic substrates by underwater laser annealing. In Society for Information Display - 19th International Display Workshops 2012, IDW/AD 2012 (Vol. 1, pp. 251-254)