Abstract
We succeeded in the super low-temperature crystallization to high-quality poly-Si films on plastic substrates by underwater laser annealing (WLA). WLA enhances the energy margin twice as high as that in laser annealing in air (LA). Moreover, the crystallinity of WLA poly-Si was much better than that of LA poly-Si.
| Original language | English |
|---|---|
| Title of host publication | Society for Information Display - 19th International Display Workshops 2012, IDW/AD 2012 |
| Pages | 251-254 |
| Number of pages | 4 |
| Volume | 1 |
| Publication status | Published - Dec 1 2012 |
| Event | 19th International Display Workshops in Conjunction with Asia Display 2012, IDW/AD 2012 - Kyoto, Japan Duration: Dec 4 2012 → Dec 7 2012 |
Other
| Other | 19th International Display Workshops in Conjunction with Asia Display 2012, IDW/AD 2012 |
|---|---|
| Country | Japan |
| City | Kyoto |
| Period | 12/4/12 → 12/7/12 |
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All Science Journal Classification (ASJC) codes
- Computer Vision and Pattern Recognition
- Human-Computer Interaction
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Radiology Nuclear Medicine and imaging
Cite this
Machida, E., Horita, M., Ishikawa, Y., Uraoka, Y., Okuyama, T., & Ikenoue, H. (2012). Super low-temperature formation of polycrystalline silicon films on plastic substrates by underwater laser annealing. In Society for Information Display - 19th International Display Workshops 2012, IDW/AD 2012 (Vol. 1, pp. 251-254)