Suppressed Surface Reorganization in a High-Density Poly(methyl methacrylate) Brush

Biao Zuo; Quanyin Xu; Tiancheng Jin; Huimin Xing; Jiacheng Shi; Zhiwei Hao; Li Zhang; Keiji Tanaka; Xinping Wang

doi:10.1021/acs.langmuir.9b02581

Suppressed Surface Reorganization in a High-Density Poly(methyl methacrylate) Brush

Biao Zuo, Quanyin Xu, Tiancheng Jin, Huimin Xing, Jiacheng Shi, Zhiwei Hao, Li Zhang, Keiji Tanaka, Xinping Wang

Applied Fine Chemistry

Research output: Contribution to journal › Article

Abstract

A high-density poly(methyl methacrylate) (PMMA) brush (σ = 0.77 chain/nm²) with a lower molecular weight distribution was prepared onto a silicon wafer by surface-initiated atom transfer radical polymerization. The surface of the PMMA brush chains was characterized upon the process of the environmental change, from air to water, using contact angle measurements in conjunction with sum-frequency generation spectroscopy. The surface structure and properties altered less with the changing environment from air to water for the PMMA brush than for a spin-coated film; that is, the extent of surface reorganization could be suppressed by grafting densely-packed chains onto a substrate. Also, the water penetration into the brush surface was inhibited because of the densely packed chain structure.

Original language	English
Pages (from-to)	14890-14895
Number of pages	6
Journal	Langmuir
Volume	35
Issue number	46
DOIs	https://doi.org/10.1021/acs.langmuir.9b02581
Publication status	Published - Nov 19 2019

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All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Surfaces and Interfaces
Spectroscopy
Electrochemistry

Cite this

Zuo, B., Xu, Q., Jin, T., Xing, H., Shi, J., Hao, Z., ... Wang, X. (2019). Suppressed Surface Reorganization in a High-Density Poly(methyl methacrylate) Brush. Langmuir, 35(46), 14890-14895. https://doi.org/10.1021/acs.langmuir.9b02581

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AU - Tanaka, Keiji

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Access to Document

10.1021/acs.langmuir.9b02581