Suppressing plasma induced degradation of gate oxide using silicon-on-insulator structures

Kiyoshi Arita, Masashi Akamatsu, Tanemasa Asano

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Fingerprint

Dive into the research topics of 'Suppressing plasma induced degradation of gate oxide using silicon-on-insulator structures'. Together they form a unique fingerprint.

Engineering

Material Science

Physics