Suppression of by-product generation in the treatment of aromatic perfumery substances using a surface discharge

Nobuya Hayashi, Shohei Sougumo

Research output: Contribution to journalArticle

Abstract

Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8% using the discharge with UV light is 96%, that is 12% higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.

Original languageEnglish
Pages (from-to)138-141
Number of pages4
JournalVacuum
Volume83
Issue number1
DOIs
Publication statusPublished - Sep 4 2008
Externally publishedYes

Fingerprint

Surface discharges
Ultraviolet radiation
Byproducts
retarding
benzene
Decomposition
decomposition
Aromatic Hydrocarbons
Ethylbenzene
Aromatic hydrocarbons
Benzene
Energy efficiency
hydrocarbons
Irradiation
irradiation
energy

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Suppression of by-product generation in the treatment of aromatic perfumery substances using a surface discharge. / Hayashi, Nobuya; Sougumo, Shohei.

In: Vacuum, Vol. 83, No. 1, 04.09.2008, p. 138-141.

Research output: Contribution to journalArticle

@article{13f2e0531ac34c81aea3ecf26f4b455a,
title = "Suppression of by-product generation in the treatment of aromatic perfumery substances using a surface discharge",
abstract = "Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8{\%} using the discharge with UV light is 96{\%}, that is 12{\%} higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.",
author = "Nobuya Hayashi and Shohei Sougumo",
year = "2008",
month = "9",
day = "4",
doi = "10.1016/j.vacuum.2008.03.058",
language = "English",
volume = "83",
pages = "138--141",
journal = "Vacuum",
issn = "0042-207X",
publisher = "Elsevier Limited",
number = "1",

}

TY - JOUR

T1 - Suppression of by-product generation in the treatment of aromatic perfumery substances using a surface discharge

AU - Hayashi, Nobuya

AU - Sougumo, Shohei

PY - 2008/9/4

Y1 - 2008/9/4

N2 - Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8% using the discharge with UV light is 96%, that is 12% higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.

AB - Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8% using the discharge with UV light is 96%, that is 12% higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.

UR - http://www.scopus.com/inward/record.url?scp=49949090899&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=49949090899&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2008.03.058

DO - 10.1016/j.vacuum.2008.03.058

M3 - Article

AN - SCOPUS:49949090899

VL - 83

SP - 138

EP - 141

JO - Vacuum

JF - Vacuum

SN - 0042-207X

IS - 1

ER -