Suppression of by-product generation in the treatment of aromatic perfumery substances using a surface discharge

Nobuya Hayashi, Shohei Sougumo

Research output: Contribution to journalArticle

Abstract

Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8% using the discharge with UV light is 96%, that is 12% higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.

Original languageEnglish
Pages (from-to)138-141
Number of pages4
JournalVacuum
Volume83
Issue number1
DOIs
Publication statusPublished - Sep 4 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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