Suppression of by-product generation in the treatment of aromatic perfumery substances using a surface discharge

Nobuya Hayashi, Shohei Sougumo

Research output: Contribution to journalArticlepeer-review

Abstract

Treatment of perfumery materials such as aromatic hydrocarbons was attempted using atmospheric surface discharge and UV light irradiation. The maximum decomposition rate of phenyl ethyl benzene with a concentration of 8% using the discharge with UV light is 96%, that is 12% higher than that without UV light. Combination of surface discharge and UV light enhances the decomposition rate and energy efficiency, and enables to suppress the generation of by-products such as benzene.

Original languageEnglish
Pages (from-to)138-141
Number of pages4
JournalVacuum
Volume83
Issue number1
DOIs
Publication statusPublished - Sep 4 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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