Surface depth analysis for fluorinated block copolymer films by X-ray photoelectron spectroscopy using C 60 cluster ion beam

Keiji Tanaka, Noriaki Sanada, Masaya Hikita, Tetsuya Nakamura, Tisato Kajiyama, Atsushi Takahara

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)

Abstract

X-ray photoelectron spectroscopy (XPS) using fullerene (C 60 ) cluster ion bombardment was applied to films of a fluorinated block copolymer. Spectra so obtained were essentially different from those using Ar ion beam. Structure in the surface region with the depth down to 60 nm drawn on the basis of XPS with C 60 beam was essentially the same as the one drawn by the result using dynamic secondary ion mass spectrometry, which is a well-established method for the depth analysis of polymers. This implies that XPS using C 60 beam enables one to gain access to the depth analysis of structure in polymer films with the depth range over the analytical depth of conventional XPS, that is, three times inelastic mean-free path of photoelectrons.

Original languageEnglish
Pages (from-to)5435-5438
Number of pages4
JournalApplied Surface Science
Volume254
Issue number17
DOIs
Publication statusPublished - Jun 30 2008

All Science Journal Classification (ASJC) codes

  • Surfaces, Coatings and Films

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