In the current work, beta-FeSi2 films were epitaxially produced onto Si(111) wafer substrates via usage of facing-targets direct-current sputtering (FTDCS). The temperature for substrate heating was maintained at 600 °C and the sputtering pressure was set at 1.33 × 10-1 Pa. The surface morphology and contact angles of the beta-FeSi2 films were explored consistently in this research. Images of three-dimensional AFM and FESEM for the beta-FeSi2 film surface revealed a smooth surface with a root mean square roughness of 1.31 nm and a porous area. The average contact angle between the dropped water and beta-FeSi2 film surface was found to be 98.7°, establishing that the surface of the beta-FeSi2 films was hydrophobic. The acquired experimental results revealed the commencement of the hydrophobic surface feature of the beta-FeSi2 films produced via FTDCS approach.
|Journal||MATEC Web of Conferences|
|Publication status||Published - Aug 14 2018|
|Event||4th International Conference on Engineering, Applied Sciences and Technology, ICEAST 2018 - Phuket, Thailand|
Duration: Jul 4 2018 → Jul 7 2018
All Science Journal Classification (ASJC) codes
- Materials Science(all)