Surface planarization effect of siloxane derivatives in organic semiconductor layers

Kei Sakanoue, Hironobu Harada, Kento Ando, Masayuki Yahiro, Jun Fukai

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The ability of siloxane surface control additives (SCAs) to planarize organic semiconductor films with a thickness of tens of nanometers printed on indium tin oxide (ITO) surfaces with stripe-patterned bank structures using a liquid-phase method is demonstrated. Three types of SCAs with different molecular structures are examined in organic solutions of toluene, anisole and tetralin containing N,N'-bis(3-methylphenyl)-N,N'-bis(phenyl)-benzidine as a solute and typical organic semiconductor. While there is an optimum SCA and concentration for each solution, one type of SCA is comprehensively effective for all solutions. This SCA increased contact angle, which is contrary to the typical behavior of SCAs. Scanning electron microscope images of the thin films near the banks reveal that this SCA did not change the contact area between the film and substrate surface, which is related to the effectiveness of the SCA. SCAs did not affect the current-voltage characteristics of green organic light-emitting diodes, but did increase external quantum efficiencies, suggesting that SCAs can be used to improve the quality of solution-deposited films for use in optical devices.

Original languageEnglish
Pages (from-to)212-219
Number of pages8
JournalThin Solid Films
Volume597
DOIs
Publication statusPublished - Dec 31 2015

Fingerprint

Siloxanes
control surfaces
Semiconducting organic compounds
Control surfaces
siloxanes
organic semiconductors
Derivatives
anisole
Toluene
Organic light emitting diodes (OLED)
Current voltage characteristics
Optical devices
Tin oxides
Quantum efficiency
indium oxides
Indium
Molecular structure
tin oxides
Contact angle
toluene

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Surface planarization effect of siloxane derivatives in organic semiconductor layers. / Sakanoue, Kei; Harada, Hironobu; Ando, Kento; Yahiro, Masayuki; Fukai, Jun.

In: Thin Solid Films, Vol. 597, 31.12.2015, p. 212-219.

Research output: Contribution to journalArticle

Sakanoue, Kei ; Harada, Hironobu ; Ando, Kento ; Yahiro, Masayuki ; Fukai, Jun. / Surface planarization effect of siloxane derivatives in organic semiconductor layers. In: Thin Solid Films. 2015 ; Vol. 597. pp. 212-219.
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