Surface reaction probabilities and kinetics of H, SiH3, Si2H5, CH3, and C2H5 during deposition of a-Si:H and a-C:H from H2, SiH4, and CH4 discharges

Jérôme Perrin, Masaharu Shiratani, Patrick Kae-Nune, Hervé Videlot, Jacques Jolly, Jean Guillon

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy