Surface reactivity and oxygen migration in amorphous indium-gallium-zinc oxide films annealed in humid atmosphere

Ken Watanabe, Dong Hee Lee, Isao Sakaguchi, Kenji Nomura, Toshio Kamiya, Hajime Haneda, Hideo Hosono, Naoki Ohashi

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

An isotope tracer study, i.e., 18O/16O exchange using 18O2 and H218O, was performed to determine how post-deposition annealing (PDA) affected surface reactivity and oxygen diffusivity of amorphous indium-gallium-zinc oxide (a-IGZO) films. The oxygen tracer diffusivity was very high in the bulk even at low temperatures, e.g., 200°C, regardless of PDA and exchange conditions. In contrast, the isotope exchange rate, dominated by surface reactivity, was much lower for 18O2 than for H218O. PDA in a humid atmosphere at 400°C further suppressed the reactivity of O2 at the a-IGZO film surface, which is attributable to -OH-terminated surface formation.

Original languageEnglish
Article number201904
JournalApplied Physics Letters
Volume103
Issue number20
DOIs
Publication statusPublished - Nov 11 2013
Externally publishedYes

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gallium oxides
zinc oxides
indium
oxide films
reactivity
atmospheres
oxygen
annealing
diffusivity
tracers
isotopes

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Surface reactivity and oxygen migration in amorphous indium-gallium-zinc oxide films annealed in humid atmosphere. / Watanabe, Ken; Lee, Dong Hee; Sakaguchi, Isao; Nomura, Kenji; Kamiya, Toshio; Haneda, Hajime; Hosono, Hideo; Ohashi, Naoki.

In: Applied Physics Letters, Vol. 103, No. 20, 201904, 11.11.2013.

Research output: Contribution to journalArticle

Watanabe, Ken ; Lee, Dong Hee ; Sakaguchi, Isao ; Nomura, Kenji ; Kamiya, Toshio ; Haneda, Hajime ; Hosono, Hideo ; Ohashi, Naoki. / Surface reactivity and oxygen migration in amorphous indium-gallium-zinc oxide films annealed in humid atmosphere. In: Applied Physics Letters. 2013 ; Vol. 103, No. 20.
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