Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization

Keiji Tanaka, Ken Kojio, Reiko Kimura, Atsushi Takahara, Tisato Kajiyama

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)

Abstract

Well-defined poly(methyl methacrylate) (PMMA) brush layers were prepared onto silicon wafers by surface-initiated atom transfer radical polymerization using 2-(4-chlorosulfonylphenyl)-ethyltrichlorosilane as an initiator. Based on molecular weight and layer thickness measurements, it was deduced that the apparent graft density was 0.6-0.8 chains nm-2 depending on the polymerization time and that the conformation of tethered chains was highly extended. Surface relaxation behavior of the PMMA brush layer and the spin-coated PMMA film was examined by lateral force microscopy. The αa- and β-relaxation processes were discernibly observed at both surfaces. Although surface molecular motion of the brush layer and the spin-coated film was markedly different from the bulk one, both were hardly distinguishable in terms of relaxation phenomena.

Original languageEnglish
Pages (from-to)44-49
Number of pages6
JournalPolymer Journal
Volume35
Issue number1
DOIs
Publication statusPublished - 2003

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

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