Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization

Keiji Tanaka, Ken Kojio, Reiko Kimura, Atsushi Takahara, Tisato Kajiyama

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

Well-defined poly(methyl methacrylate) (PMMA) brush layers were prepared onto silicon wafers by surface-initiated atom transfer radical polymerization using 2-(4-chlorosulfonylphenyl)-ethyltrichlorosilane as an initiator. Based on molecular weight and layer thickness measurements, it was deduced that the apparent graft density was 0.6-0.8 chains nm-2 depending on the polymerization time and that the conformation of tethered chains was highly extended. Surface relaxation behavior of the PMMA brush layer and the spin-coated PMMA film was examined by lateral force microscopy. The αa- and β-relaxation processes were discernibly observed at both surfaces. Although surface molecular motion of the brush layer and the spin-coated film was markedly different from the bulk one, both were hardly distinguishable in terms of relaxation phenomena.

Original languageEnglish
Pages (from-to)44-49
Number of pages6
JournalPolymer Journal
Volume35
Issue number1
DOIs
Publication statusPublished - Mar 27 2003

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Surface relaxation
Atom transfer radical polymerization
Relaxation processes
Polymethyl Methacrylate
Brushes
Polymethyl methacrylates
Thickness measurement
Silicon wafers
Grafts
Conformations
Microscopic examination
Molecular weight
Polymerization

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization. / Tanaka, Keiji; Kojio, Ken; Kimura, Reiko; Takahara, Atsushi; Kajiyama, Tisato.

In: Polymer Journal, Vol. 35, No. 1, 27.03.2003, p. 44-49.

Research output: Contribution to journalArticle

@article{60e23d799d5e425a8c858e493e088cbf,
title = "Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization",
abstract = "Well-defined poly(methyl methacrylate) (PMMA) brush layers were prepared onto silicon wafers by surface-initiated atom transfer radical polymerization using 2-(4-chlorosulfonylphenyl)-ethyltrichlorosilane as an initiator. Based on molecular weight and layer thickness measurements, it was deduced that the apparent graft density was 0.6-0.8 chains nm-2 depending on the polymerization time and that the conformation of tethered chains was highly extended. Surface relaxation behavior of the PMMA brush layer and the spin-coated PMMA film was examined by lateral force microscopy. The αa- and β-relaxation processes were discernibly observed at both surfaces. Although surface molecular motion of the brush layer and the spin-coated film was markedly different from the bulk one, both were hardly distinguishable in terms of relaxation phenomena.",
author = "Keiji Tanaka and Ken Kojio and Reiko Kimura and Atsushi Takahara and Tisato Kajiyama",
year = "2003",
month = "3",
day = "27",
doi = "10.1295/polymj.35.44",
language = "English",
volume = "35",
pages = "44--49",
journal = "Polymer Journal",
issn = "0032-3896",
publisher = "Nature Publishing Group",
number = "1",

}

TY - JOUR

T1 - Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization

AU - Tanaka, Keiji

AU - Kojio, Ken

AU - Kimura, Reiko

AU - Takahara, Atsushi

AU - Kajiyama, Tisato

PY - 2003/3/27

Y1 - 2003/3/27

N2 - Well-defined poly(methyl methacrylate) (PMMA) brush layers were prepared onto silicon wafers by surface-initiated atom transfer radical polymerization using 2-(4-chlorosulfonylphenyl)-ethyltrichlorosilane as an initiator. Based on molecular weight and layer thickness measurements, it was deduced that the apparent graft density was 0.6-0.8 chains nm-2 depending on the polymerization time and that the conformation of tethered chains was highly extended. Surface relaxation behavior of the PMMA brush layer and the spin-coated PMMA film was examined by lateral force microscopy. The αa- and β-relaxation processes were discernibly observed at both surfaces. Although surface molecular motion of the brush layer and the spin-coated film was markedly different from the bulk one, both were hardly distinguishable in terms of relaxation phenomena.

AB - Well-defined poly(methyl methacrylate) (PMMA) brush layers were prepared onto silicon wafers by surface-initiated atom transfer radical polymerization using 2-(4-chlorosulfonylphenyl)-ethyltrichlorosilane as an initiator. Based on molecular weight and layer thickness measurements, it was deduced that the apparent graft density was 0.6-0.8 chains nm-2 depending on the polymerization time and that the conformation of tethered chains was highly extended. Surface relaxation behavior of the PMMA brush layer and the spin-coated PMMA film was examined by lateral force microscopy. The αa- and β-relaxation processes were discernibly observed at both surfaces. Although surface molecular motion of the brush layer and the spin-coated film was markedly different from the bulk one, both were hardly distinguishable in terms of relaxation phenomena.

UR - http://www.scopus.com/inward/record.url?scp=0037226662&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037226662&partnerID=8YFLogxK

U2 - 10.1295/polymj.35.44

DO - 10.1295/polymj.35.44

M3 - Article

AN - SCOPUS:0037226662

VL - 35

SP - 44

EP - 49

JO - Polymer Journal

JF - Polymer Journal

SN - 0032-3896

IS - 1

ER -