Surface structure study and structure determination of (√3 × √3)R 30° phase of Si-adsorption on Ni(111) by LEED

Md Sazzadur Rahman, Mohammad Tawheed Kibria, Takeshi Nakagawa, Seigi Mizuno

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    The phase evolution of Si on Ni (111) was studied by LEED and AES. A new phase of Si on Ni (111) was found along with the previously reported (√3 × √3)R 30° phase. The surface structure of (√3 × √3)R 30° phase had determined, with chemical composition of Ni2Si, by using low-energy electron diffraction (LEED) analysis. The obtained nickel silicide would be helpful for understanding the formation of Schottky barrier at semiconductor-metal interface.

    Original languageEnglish
    Title of host publication2015 4th International Conference on Informatics, Electronics and Vision, ICIEV 2015
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    ISBN (Electronic)9781467369022
    DOIs
    Publication statusPublished - Nov 20 2015
    Event4th International Conference on Informatics, Electronics and Vision, ICIEV 2015 - Fukuoka, Japan
    Duration: Jun 15 2015Jun 18 2015

    Publication series

    Name2015 4th International Conference on Informatics, Electronics and Vision, ICIEV 2015

    Other

    Other4th International Conference on Informatics, Electronics and Vision, ICIEV 2015
    Country/TerritoryJapan
    CityFukuoka
    Period6/15/156/18/15

    All Science Journal Classification (ASJC) codes

    • Computer Vision and Pattern Recognition
    • Information Systems
    • Electrical and Electronic Engineering

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