Surface structure study and structure determination of (√3 × √3)R 30° phase of Si-adsorption on Ni(111) by LEED

Md Sazzadur Rahman, Mohammad Tawheed Kibria, Takeshi Nakagawa, Seigi Mizuno

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    The phase evolution of Si on Ni (111) was studied by LEED and AES. A new phase of Si on Ni (111) was found along with the previously reported (√3 × √3)R 30° phase. The surface structure of (√3 × √3)R 30° phase had determined, with chemical composition of Ni2Si, by using low-energy electron diffraction (LEED) analysis. The obtained nickel silicide would be helpful for understanding the formation of Schottky barrier at semiconductor-metal interface.

    Original languageEnglish
    Title of host publication2015 4th International Conference on Informatics, Electronics and Vision, ICIEV 2015
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    ISBN (Electronic)9781467369022
    DOIs
    Publication statusPublished - Nov 20 2015
    Event4th International Conference on Informatics, Electronics and Vision, ICIEV 2015 - Fukuoka, Japan
    Duration: Jun 15 2015Jun 18 2015

    Publication series

    Name2015 4th International Conference on Informatics, Electronics and Vision, ICIEV 2015

    Other

    Other4th International Conference on Informatics, Electronics and Vision, ICIEV 2015
    CountryJapan
    CityFukuoka
    Period6/15/156/18/15

    All Science Journal Classification (ASJC) codes

    • Computer Vision and Pattern Recognition
    • Information Systems
    • Electrical and Electronic Engineering

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