Synthesis and self-assembly of thermotropic block copolymer with long alkyl tethered cage silsesquioxane in the side chain

Yoshihito Ishida, Tomoyasu Hirai, Raita Goseki, Masatoshi Tokita, Masa Aki Kakimoto, Teruaki Hayakawa

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

Thermotropic POSS-containing poly(methacrylate) with long alkyl chain tethered polyhedral oligomeric silsesquioxane (POSS) in the side chain and the block copolymers (PMMA-b-PMAC11POSS) were developed by through living anionic polymerization. The resulting polymers indicated a phase transition temperature at 112 °C from spherocrystal to isotropic phase. The POSS-containing polymer segments tended to form matrix of microphase-separated nanostructures in the bulk even in the very low volume fraction, for instance, PMMA cylindrical nanostructure was obtained by PMMA175-b-PMAC11POSS11PMAC11POSS = 0.44). The control of thin film morphology was carried out by not only solvent annealing, but also thermal annealing, resulting in the formation of well-ordered dot- and fingerprint-type nanostructures. This is the first report in a series of POSS-containing block polymers that are capable for thermal annealing to generate well-ordered microphase-separated nanostructures in thin films. The novel thermotropic POSS-containing block copolymer offers a promising material for block copolymer lithography.

Original languageEnglish
Pages (from-to)2653-2664
Number of pages12
JournalJournal of Polymer Science, Part A: Polymer Chemistry
Volume49
Issue number12
DOIs
Publication statusPublished - Jun 15 2011

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Self assembly
Block copolymers
Nanostructures
Polymethyl Methacrylate
Annealing
Polymers
Thin films
Living polymerization
Anionic polymerization
Methacrylates
Lithography
Superconducting transition temperature
Volume fraction
Phase transitions
Hot Temperature

All Science Journal Classification (ASJC) codes

  • Materials Chemistry
  • Polymers and Plastics
  • Organic Chemistry

Cite this

Synthesis and self-assembly of thermotropic block copolymer with long alkyl tethered cage silsesquioxane in the side chain. / Ishida, Yoshihito; Hirai, Tomoyasu; Goseki, Raita; Tokita, Masatoshi; Kakimoto, Masa Aki; Hayakawa, Teruaki.

In: Journal of Polymer Science, Part A: Polymer Chemistry, Vol. 49, No. 12, 15.06.2011, p. 2653-2664.

Research output: Contribution to journalArticle

Ishida, Yoshihito ; Hirai, Tomoyasu ; Goseki, Raita ; Tokita, Masatoshi ; Kakimoto, Masa Aki ; Hayakawa, Teruaki. / Synthesis and self-assembly of thermotropic block copolymer with long alkyl tethered cage silsesquioxane in the side chain. In: Journal of Polymer Science, Part A: Polymer Chemistry. 2011 ; Vol. 49, No. 12. pp. 2653-2664.
@article{ffdacc7750644f39abe9dfce5157f407,
title = "Synthesis and self-assembly of thermotropic block copolymer with long alkyl tethered cage silsesquioxane in the side chain",
abstract = "Thermotropic POSS-containing poly(methacrylate) with long alkyl chain tethered polyhedral oligomeric silsesquioxane (POSS) in the side chain and the block copolymers (PMMA-b-PMAC11POSS) were developed by through living anionic polymerization. The resulting polymers indicated a phase transition temperature at 112 °C from spherocrystal to isotropic phase. The POSS-containing polymer segments tended to form matrix of microphase-separated nanostructures in the bulk even in the very low volume fraction, for instance, PMMA cylindrical nanostructure was obtained by PMMA175-b-PMAC11POSS11 (φPMAC11POSS = 0.44). The control of thin film morphology was carried out by not only solvent annealing, but also thermal annealing, resulting in the formation of well-ordered dot- and fingerprint-type nanostructures. This is the first report in a series of POSS-containing block polymers that are capable for thermal annealing to generate well-ordered microphase-separated nanostructures in thin films. The novel thermotropic POSS-containing block copolymer offers a promising material for block copolymer lithography.",
author = "Yoshihito Ishida and Tomoyasu Hirai and Raita Goseki and Masatoshi Tokita and Kakimoto, {Masa Aki} and Teruaki Hayakawa",
year = "2011",
month = "6",
day = "15",
doi = "10.1002/pola.24697",
language = "English",
volume = "49",
pages = "2653--2664",
journal = "Journal of Polymer Science, Part A: Polymer Chemistry",
issn = "0887-624X",
publisher = "John Wiley and Sons Inc.",
number = "12",

}

TY - JOUR

T1 - Synthesis and self-assembly of thermotropic block copolymer with long alkyl tethered cage silsesquioxane in the side chain

AU - Ishida, Yoshihito

AU - Hirai, Tomoyasu

AU - Goseki, Raita

AU - Tokita, Masatoshi

AU - Kakimoto, Masa Aki

AU - Hayakawa, Teruaki

PY - 2011/6/15

Y1 - 2011/6/15

N2 - Thermotropic POSS-containing poly(methacrylate) with long alkyl chain tethered polyhedral oligomeric silsesquioxane (POSS) in the side chain and the block copolymers (PMMA-b-PMAC11POSS) were developed by through living anionic polymerization. The resulting polymers indicated a phase transition temperature at 112 °C from spherocrystal to isotropic phase. The POSS-containing polymer segments tended to form matrix of microphase-separated nanostructures in the bulk even in the very low volume fraction, for instance, PMMA cylindrical nanostructure was obtained by PMMA175-b-PMAC11POSS11 (φPMAC11POSS = 0.44). The control of thin film morphology was carried out by not only solvent annealing, but also thermal annealing, resulting in the formation of well-ordered dot- and fingerprint-type nanostructures. This is the first report in a series of POSS-containing block polymers that are capable for thermal annealing to generate well-ordered microphase-separated nanostructures in thin films. The novel thermotropic POSS-containing block copolymer offers a promising material for block copolymer lithography.

AB - Thermotropic POSS-containing poly(methacrylate) with long alkyl chain tethered polyhedral oligomeric silsesquioxane (POSS) in the side chain and the block copolymers (PMMA-b-PMAC11POSS) were developed by through living anionic polymerization. The resulting polymers indicated a phase transition temperature at 112 °C from spherocrystal to isotropic phase. The POSS-containing polymer segments tended to form matrix of microphase-separated nanostructures in the bulk even in the very low volume fraction, for instance, PMMA cylindrical nanostructure was obtained by PMMA175-b-PMAC11POSS11 (φPMAC11POSS = 0.44). The control of thin film morphology was carried out by not only solvent annealing, but also thermal annealing, resulting in the formation of well-ordered dot- and fingerprint-type nanostructures. This is the first report in a series of POSS-containing block polymers that are capable for thermal annealing to generate well-ordered microphase-separated nanostructures in thin films. The novel thermotropic POSS-containing block copolymer offers a promising material for block copolymer lithography.

UR - http://www.scopus.com/inward/record.url?scp=79955758614&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79955758614&partnerID=8YFLogxK

U2 - 10.1002/pola.24697

DO - 10.1002/pola.24697

M3 - Article

AN - SCOPUS:79955758614

VL - 49

SP - 2653

EP - 2664

JO - Journal of Polymer Science, Part A: Polymer Chemistry

JF - Journal of Polymer Science, Part A: Polymer Chemistry

SN - 0887-624X

IS - 12

ER -