Synthesis and self-assembly of thermotropic block copolymer with long alkyl tethered cage silsesquioxane in the side chain

Yoshihito Ishida, Tomoyasu Hirai, Raita Goseki, Masatoshi Tokita, Masa Aki Kakimoto, Teruaki Hayakawa

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)

Abstract

Thermotropic POSS-containing poly(methacrylate) with long alkyl chain tethered polyhedral oligomeric silsesquioxane (POSS) in the side chain and the block copolymers (PMMA-b-PMAC11POSS) were developed by through living anionic polymerization. The resulting polymers indicated a phase transition temperature at 112 °C from spherocrystal to isotropic phase. The POSS-containing polymer segments tended to form matrix of microphase-separated nanostructures in the bulk even in the very low volume fraction, for instance, PMMA cylindrical nanostructure was obtained by PMMA175-b-PMAC11POSS11PMAC11POSS = 0.44). The control of thin film morphology was carried out by not only solvent annealing, but also thermal annealing, resulting in the formation of well-ordered dot- and fingerprint-type nanostructures. This is the first report in a series of POSS-containing block polymers that are capable for thermal annealing to generate well-ordered microphase-separated nanostructures in thin films. The novel thermotropic POSS-containing block copolymer offers a promising material for block copolymer lithography.

Original languageEnglish
Pages (from-to)2653-2664
Number of pages12
JournalJournal of Polymer Science, Part A: Polymer Chemistry
Volume49
Issue number12
DOIs
Publication statusPublished - Jun 15 2011

All Science Journal Classification (ASJC) codes

  • Materials Chemistry
  • Polymers and Plastics
  • Organic Chemistry

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