Technology mapping technique for throughput enhancement of character projection equipment

Makoto Sugihara, Taiga Takata, Kenta Nakamura, Ryoichi Inanami, Hiroaki Hayashi, Katsumi Kishimoto, Tetsuya Hasebe, Yukihiro Kawano, Yusuke Matsunaga, Kazuaki Murakami, Katsuya Okumura

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Citations (Scopus)

Abstract

The character projection is utilized for maskless lithography and is a potential for the future photomask manufacture. The drawback of the character projection is its low throughput and leads to a price rise of ICs. This paper discusses a technology mapping technique for enhancing the throughput of the character projection. The number of EB shots to draw an entire chip determines the fabrication time for the chip. Reduction of the number of EB shots, therefore, increases the throughput of character projection equipment and reduces the cost to produce ICs. Our technology mapping technique aims to reduce the number of EB shots to draw an entire chip for increasing the throughput of character projection equipment. Our technique treats the number of EB shots as an objective to minimize. Comparing with an conventional technology mapping, our technology mapping technique achieved 19.6% reduction of the number of EB shots without any performance degradation of ICs. Moreover, our technology mapping technique achieved 48.8% reduction of the number of EB shots under no performance constraints. Our technique is easy for both IC designers and equipment developers to adopt because it is a software approach with no additional modification on character projection equipment.

Original languageEnglish
Title of host publicationEmerging Lithographic Technologies X
DOIs
Publication statusPublished - Jul 10 2006
EventEmerging Lithographic Technologies X - San Jose, CA, United States
Duration: Jan 21 2006Jan 23 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6151 I
ISSN (Print)0277-786X

Other

OtherEmerging Lithographic Technologies X
CountryUnited States
CitySan Jose, CA
Period1/21/061/23/06

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Sugihara, M., Takata, T., Nakamura, K., Inanami, R., Hayashi, H., Kishimoto, K., ... Okumura, K. (2006). Technology mapping technique for throughput enhancement of character projection equipment. In Emerging Lithographic Technologies X [61510Z] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6151 I). https://doi.org/10.1117/12.656153