Temperature-dependent interlayer coupling in Fe3Si/FeSi 2 artificial lattices

Ken Ichiro Sakai, Yuta Noda, Daiki Tsumagari, Hiroyuki Deguchi, Kaoru Takeda, Tsuyoshi Yoshitake

    Research output: Contribution to journalArticle

    Abstract

    Fe3Si/FeSi2 artificial lattices, wherein ferromagnetic (F)/antiferromagnetic (AF) interlayer coupling between the Fe 3Si layers were induced by controlling the thickness of FeSi 2 layers, were prepared on Si(111) substrates by facing targets direct-current sputtering. The interlayer couplings were investigated at different temperatures by measuring the magnetization curves. The AF coupling at room temperature was gradually weakened with a decrease in the temperature, and it finally became ferromagnetic or noncoupled at temperatures lower than 77 K. We consider that the FeSi2 layers act as semiconductors and their change in the electric state for the temperature induces the interlayer coupling switching.

    Original languageEnglish
    Pages (from-to)323-328
    Number of pages6
    JournalPhysica Status Solidi (A) Applications and Materials Science
    Volume211
    Issue number2
    DOIs
    Publication statusPublished - Feb 2014

    All Science Journal Classification (ASJC) codes

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Electrical and Electronic Engineering
    • Materials Chemistry

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