The characteristics of multilayer thin films deposited with metal thin films (Ag, Al, Cu)

Dong Hun Kim, Ri Ichi Murakami, Yun Hae Kim, Kyung Man Moon, Seung Jun An, Tae Hyun Kim, Pang Pang Wang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

In order to study the characteristics of multilayer thin films with a ZnO/ metal/ ZnO structure the manufacture of the thin films was performed by a dc (direct current) magnetron sputtering system on slide glass substrates. The ZnO thin films were manufactured with the thicknesses of 30 nm and 50 nm. Three kinds of metals (Ag, Al and Cu) were deposited with the thicknesses of 4 nm, 8 nm, 12 nm and 16 nm. The electrical and optical properties of the manufactured thin films were then observed. As a result, the multilayer thin films with an Ag layer represented the most excellent electrical conductivity. This is due to the difference in the fundamental electrical properties of each of the metals. The structures of the metal particles deposited on the ZnO thin films were observed by an SEM (scanning electron microscope). The thin films exhibited a continuous structure with regular spaces between the metal particles. This resulted in an increase of transmittance. This is considered by the decrease of scattering and of light absorption on thin films with a continuous structure.

Original languageEnglish
Title of host publicationManufacturing Science and Engineering I
Pages1768-1771
Number of pages4
DOIs
Publication statusPublished - Apr 22 2010
Event2009 International Conference on Manufacturing Science and Engineering, ICMSE 2009 - Zhuhai, China
Duration: Dec 26 2009Dec 28 2009

Publication series

NameAdvanced Materials Research
Volume97-101
ISSN (Print)1022-6680

Other

Other2009 International Conference on Manufacturing Science and Engineering, ICMSE 2009
CountryChina
CityZhuhai
Period12/26/0912/28/09

Fingerprint

Multilayer films
Thin films
Metals
Electric properties
Magnetron sputtering
Light absorption
Electron microscopes
Optical properties
Scattering
Scanning
Glass
Substrates

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Kim, D. H., Murakami, R. I., Kim, Y. H., Moon, K. M., An, S. J., Kim, T. H., & Wang, P. P. (2010). The characteristics of multilayer thin films deposited with metal thin films (Ag, Al, Cu). In Manufacturing Science and Engineering I (pp. 1768-1771). (Advanced Materials Research; Vol. 97-101). https://doi.org/10.4028/www.scientific.net/AMR.97-101.1768

The characteristics of multilayer thin films deposited with metal thin films (Ag, Al, Cu). / Kim, Dong Hun; Murakami, Ri Ichi; Kim, Yun Hae; Moon, Kyung Man; An, Seung Jun; Kim, Tae Hyun; Wang, Pang Pang.

Manufacturing Science and Engineering I. 2010. p. 1768-1771 (Advanced Materials Research; Vol. 97-101).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, DH, Murakami, RI, Kim, YH, Moon, KM, An, SJ, Kim, TH & Wang, PP 2010, The characteristics of multilayer thin films deposited with metal thin films (Ag, Al, Cu). in Manufacturing Science and Engineering I. Advanced Materials Research, vol. 97-101, pp. 1768-1771, 2009 International Conference on Manufacturing Science and Engineering, ICMSE 2009, Zhuhai, China, 12/26/09. https://doi.org/10.4028/www.scientific.net/AMR.97-101.1768
Kim DH, Murakami RI, Kim YH, Moon KM, An SJ, Kim TH et al. The characteristics of multilayer thin films deposited with metal thin films (Ag, Al, Cu). In Manufacturing Science and Engineering I. 2010. p. 1768-1771. (Advanced Materials Research). https://doi.org/10.4028/www.scientific.net/AMR.97-101.1768
Kim, Dong Hun ; Murakami, Ri Ichi ; Kim, Yun Hae ; Moon, Kyung Man ; An, Seung Jun ; Kim, Tae Hyun ; Wang, Pang Pang. / The characteristics of multilayer thin films deposited with metal thin films (Ag, Al, Cu). Manufacturing Science and Engineering I. 2010. pp. 1768-1771 (Advanced Materials Research).
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