The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

Taojun Fang, Kenji Yamaki, Kazunori Koga, Daisuke Yamashita, Hyunwoong Seo, Naho Itagaki, Masaharu Shiratani, Kosuke Takenaka, Yuichi Setsuhara

Research output: Contribution to journalArticle

Abstract

To produce hydrogenated amorphous carbon (a-C:H) films with high mass density at a high deposition rate and low substrate bias voltage, we deposited these films on a Si substrate by plasma chemical vapor deposition, using toluene as a source compound and varying the gas flow-rate ratio of H2/(H2 + Ar). By decreasing the gas flow-rate ratio from 55% to 11%, the hydrogen content in the films decreased, and the density of sp3 carbon atoms in the films increased, whereas their surface roughness increased. At the gas flow-rate ratio of 11%, we produced a-C:H films with a high bulk density of 1830 kg/m3 at a high deposition rate of 81.1 nm/min.

Original languageEnglish
Pages (from-to)891-898
Number of pages8
JournalThin Solid Films
Volume660
DOIs
Publication statusPublished - Aug 30 2018

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Chemical vapor deposition
flow velocity
Flow rate
vapor deposition
Plasmas
carbon
gas flow
Flow of gases
Deposition rates
Toluene
Substrates
Bias voltage
toluene
Hydrogen
surface roughness
Carbon
Surface roughness

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition. / Fang, Taojun; Yamaki, Kenji; Koga, Kazunori; Yamashita, Daisuke; Seo, Hyunwoong; Itagaki, Naho; Shiratani, Masaharu; Takenaka, Kosuke; Setsuhara, Yuichi.

In: Thin Solid Films, Vol. 660, 30.08.2018, p. 891-898.

Research output: Contribution to journalArticle

Fang, Taojun ; Yamaki, Kenji ; Koga, Kazunori ; Yamashita, Daisuke ; Seo, Hyunwoong ; Itagaki, Naho ; Shiratani, Masaharu ; Takenaka, Kosuke ; Setsuhara, Yuichi. / The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition. In: Thin Solid Films. 2018 ; Vol. 660. pp. 891-898.
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AU - Fang, Taojun

AU - Yamaki, Kenji

AU - Koga, Kazunori

AU - Yamashita, Daisuke

AU - Seo, Hyunwoong

AU - Itagaki, Naho

AU - Shiratani, Masaharu

AU - Takenaka, Kosuke

AU - Setsuhara, Yuichi

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