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The effects of strong oxidizing slurry and processing atmosphere on double-sided CMP of SiC wafer
Tao Yin, Toshiro Doi, Syuhei Kurokawa, Osamu Ohnishi, Tsutomu Yamazaki, Zhida Wang, Zhe Tan
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
10
Citations
(Scopus)