The influence of 173 MeV Xe-ion irradiation on the microstructure of YBa2Cu3O7 thin films

Hideo Watanabe, B. Kabius, K. Urban, B. Roas, S. Klaumünzer, G. Saemann-Ischenko

Research output: Contribution to journalArticle

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Abstract

YBa2Cu3O7 thin films grown epitaxially on [001] SrTiO3 substrates have been irradiated at a temperature of 77 K with 173 MeV Xe-ions up to a dose of 3×1016 m-2. A study of the irradiated films by transmission electron microscopy revealed amorphous channels with diameters between 2 and 4 nm. The density of these channels depended on the irradiated dose. The twin structure of the orthorhombic phase of YBa2Cu3O7 was found to disappear for high irradiation doses. It is concluded that the amorphous regions were introduced along the paths of Xe-ions as a results of electronic excitation. These regions can act as pinning centres for magnetic flux lines.

Original languageEnglish
Pages (from-to)75-84
Number of pages10
JournalPhysica C: Superconductivity and its Applications
Volume179
Issue number1-3
DOIs
Publication statusPublished - Aug 15 1991

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Energy Engineering and Power Technology
  • Electrical and Electronic Engineering

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