The reason why thin-film silicon grows layer by layer in plasma-enhanced chemical vapor deposition

Takuya Kuwahara, Hiroshi Ito, Kentaro Kawaguchi, Yuji Higuchi, Nobuki Ozawa, Momoji Kubo

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Fingerprint

Dive into the research topics of 'The reason why thin-film silicon grows layer by layer in plasma-enhanced chemical vapor deposition'. Together they form a unique fingerprint.

Physics

Earth and Planetary Sciences