The stability of titania-silica interface

Aleksandar Tsekov Staykov, Elias Paiva Ferreira-Neto, Jean Mina Ybarrena Santa Cruz, Sajjad Ullah, Ubirajara Pereira Rodrigues-Filho

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Silica is very often the catalyst support of choice for transition metal oxides such as titania, and specially anatase. Titania is an excellent absorber and photocatalyst for many organic molecules degradation. In order to understand the chemical nature of the interaction between titania and silica, we have performed a theoretical study using density functional theory aiming to elucidate the role on the stability of the interface of the specific type of interactions, H-bonding, covalent bonding of the pristine surfaces, and covalent bonding after silicon and titanium ions interdiffusion. The calculations were carried out for hydrogen and oxygen terminated surface, comparing the bonding types and the forces acting along the interface. The interface dynamics was studied for interfaces under applied stress in order to elucidate their stability and failure limits. The shearing forces and the mechanisms of interface failure were determined. Interfaces with interdiffused Si and Ti ions were studied to improve the interface stabilization. The results demonstrate that high-temperature treatment leading to formation of SiOTi bonds at the interface is responsible for the formation of strong and flexible binding interaction between both oxides. At high strains, the SiOTi interface failure is observed due to lattice mismatch between the SiO2 and TiO2. The failure is a result of forces acting orthogonal to the interface shearing. In case of hydrogen terminated surface, the interface binding is a result of hydrogen bond network. Such interface is fragile at moderate shearing forces along the applied strain. The hydrogen bond network decreases the elastic properties and flexibility of the interface. The SiO2/TiO2 interface is further stabilized by Si/Ti ion interdiffusion. The ionic interdiffusion process also increases the interface flexibility. Thus, in order to obtain more stable anatase photocatalyst supported on silica, the synthetic routes should favor silicon and titanium ions interdiffusion along the interface.

Original languageEnglish
Article numbere25495
JournalInternational Journal of Quantum Chemistry
Volume118
Issue number4
DOIs
Publication statusPublished - Feb 15 2018

Fingerprint

Silicon Dioxide
titanium
silicon dioxide
Shearing
Ions
Silicon
Photocatalysts
Titanium
Oxides
Hydrogen
Hydrogen bonds
Lattice mismatch
Catalyst supports
shearing
Transition metals
Density functional theory
Stabilization
titanium dioxide
Oxygen
Degradation

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Physical and Theoretical Chemistry

Cite this

Staykov, A. T., Ferreira-Neto, E. P., Cruz, J. M. Y. S., Ullah, S., & Rodrigues-Filho, U. P. (2018). The stability of titania-silica interface. International Journal of Quantum Chemistry, 118(4), [e25495]. https://doi.org/10.1002/qua.25495

The stability of titania-silica interface. / Staykov, Aleksandar Tsekov; Ferreira-Neto, Elias Paiva; Cruz, Jean Mina Ybarrena Santa; Ullah, Sajjad; Rodrigues-Filho, Ubirajara Pereira.

In: International Journal of Quantum Chemistry, Vol. 118, No. 4, e25495, 15.02.2018.

Research output: Contribution to journalArticle

Staykov, AT, Ferreira-Neto, EP, Cruz, JMYS, Ullah, S & Rodrigues-Filho, UP 2018, 'The stability of titania-silica interface', International Journal of Quantum Chemistry, vol. 118, no. 4, e25495. https://doi.org/10.1002/qua.25495
Staykov AT, Ferreira-Neto EP, Cruz JMYS, Ullah S, Rodrigues-Filho UP. The stability of titania-silica interface. International Journal of Quantum Chemistry. 2018 Feb 15;118(4). e25495. https://doi.org/10.1002/qua.25495
Staykov, Aleksandar Tsekov ; Ferreira-Neto, Elias Paiva ; Cruz, Jean Mina Ybarrena Santa ; Ullah, Sajjad ; Rodrigues-Filho, Ubirajara Pereira. / The stability of titania-silica interface. In: International Journal of Quantum Chemistry. 2018 ; Vol. 118, No. 4.
@article{7c96f5cf6a8f47788a33c7355c974166,
title = "The stability of titania-silica interface",
abstract = "Silica is very often the catalyst support of choice for transition metal oxides such as titania, and specially anatase. Titania is an excellent absorber and photocatalyst for many organic molecules degradation. In order to understand the chemical nature of the interaction between titania and silica, we have performed a theoretical study using density functional theory aiming to elucidate the role on the stability of the interface of the specific type of interactions, H-bonding, covalent bonding of the pristine surfaces, and covalent bonding after silicon and titanium ions interdiffusion. The calculations were carried out for hydrogen and oxygen terminated surface, comparing the bonding types and the forces acting along the interface. The interface dynamics was studied for interfaces under applied stress in order to elucidate their stability and failure limits. The shearing forces and the mechanisms of interface failure were determined. Interfaces with interdiffused Si and Ti ions were studied to improve the interface stabilization. The results demonstrate that high-temperature treatment leading to formation of SiOTi bonds at the interface is responsible for the formation of strong and flexible binding interaction between both oxides. At high strains, the SiOTi interface failure is observed due to lattice mismatch between the SiO2 and TiO2. The failure is a result of forces acting orthogonal to the interface shearing. In case of hydrogen terminated surface, the interface binding is a result of hydrogen bond network. Such interface is fragile at moderate shearing forces along the applied strain. The hydrogen bond network decreases the elastic properties and flexibility of the interface. The SiO2/TiO2 interface is further stabilized by Si/Ti ion interdiffusion. The ionic interdiffusion process also increases the interface flexibility. Thus, in order to obtain more stable anatase photocatalyst supported on silica, the synthetic routes should favor silicon and titanium ions interdiffusion along the interface.",
author = "Staykov, {Aleksandar Tsekov} and Ferreira-Neto, {Elias Paiva} and Cruz, {Jean Mina Ybarrena Santa} and Sajjad Ullah and Rodrigues-Filho, {Ubirajara Pereira}",
year = "2018",
month = "2",
day = "15",
doi = "10.1002/qua.25495",
language = "English",
volume = "118",
journal = "International Journal of Quantum Chemistry",
issn = "0020-7608",
publisher = "John Wiley and Sons Inc.",
number = "4",

}

TY - JOUR

T1 - The stability of titania-silica interface

AU - Staykov, Aleksandar Tsekov

AU - Ferreira-Neto, Elias Paiva

AU - Cruz, Jean Mina Ybarrena Santa

AU - Ullah, Sajjad

AU - Rodrigues-Filho, Ubirajara Pereira

PY - 2018/2/15

Y1 - 2018/2/15

N2 - Silica is very often the catalyst support of choice for transition metal oxides such as titania, and specially anatase. Titania is an excellent absorber and photocatalyst for many organic molecules degradation. In order to understand the chemical nature of the interaction between titania and silica, we have performed a theoretical study using density functional theory aiming to elucidate the role on the stability of the interface of the specific type of interactions, H-bonding, covalent bonding of the pristine surfaces, and covalent bonding after silicon and titanium ions interdiffusion. The calculations were carried out for hydrogen and oxygen terminated surface, comparing the bonding types and the forces acting along the interface. The interface dynamics was studied for interfaces under applied stress in order to elucidate their stability and failure limits. The shearing forces and the mechanisms of interface failure were determined. Interfaces with interdiffused Si and Ti ions were studied to improve the interface stabilization. The results demonstrate that high-temperature treatment leading to formation of SiOTi bonds at the interface is responsible for the formation of strong and flexible binding interaction between both oxides. At high strains, the SiOTi interface failure is observed due to lattice mismatch between the SiO2 and TiO2. The failure is a result of forces acting orthogonal to the interface shearing. In case of hydrogen terminated surface, the interface binding is a result of hydrogen bond network. Such interface is fragile at moderate shearing forces along the applied strain. The hydrogen bond network decreases the elastic properties and flexibility of the interface. The SiO2/TiO2 interface is further stabilized by Si/Ti ion interdiffusion. The ionic interdiffusion process also increases the interface flexibility. Thus, in order to obtain more stable anatase photocatalyst supported on silica, the synthetic routes should favor silicon and titanium ions interdiffusion along the interface.

AB - Silica is very often the catalyst support of choice for transition metal oxides such as titania, and specially anatase. Titania is an excellent absorber and photocatalyst for many organic molecules degradation. In order to understand the chemical nature of the interaction between titania and silica, we have performed a theoretical study using density functional theory aiming to elucidate the role on the stability of the interface of the specific type of interactions, H-bonding, covalent bonding of the pristine surfaces, and covalent bonding after silicon and titanium ions interdiffusion. The calculations were carried out for hydrogen and oxygen terminated surface, comparing the bonding types and the forces acting along the interface. The interface dynamics was studied for interfaces under applied stress in order to elucidate their stability and failure limits. The shearing forces and the mechanisms of interface failure were determined. Interfaces with interdiffused Si and Ti ions were studied to improve the interface stabilization. The results demonstrate that high-temperature treatment leading to formation of SiOTi bonds at the interface is responsible for the formation of strong and flexible binding interaction between both oxides. At high strains, the SiOTi interface failure is observed due to lattice mismatch between the SiO2 and TiO2. The failure is a result of forces acting orthogonal to the interface shearing. In case of hydrogen terminated surface, the interface binding is a result of hydrogen bond network. Such interface is fragile at moderate shearing forces along the applied strain. The hydrogen bond network decreases the elastic properties and flexibility of the interface. The SiO2/TiO2 interface is further stabilized by Si/Ti ion interdiffusion. The ionic interdiffusion process also increases the interface flexibility. Thus, in order to obtain more stable anatase photocatalyst supported on silica, the synthetic routes should favor silicon and titanium ions interdiffusion along the interface.

UR - http://www.scopus.com/inward/record.url?scp=85040128706&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85040128706&partnerID=8YFLogxK

U2 - 10.1002/qua.25495

DO - 10.1002/qua.25495

M3 - Article

AN - SCOPUS:85040128706

VL - 118

JO - International Journal of Quantum Chemistry

JF - International Journal of Quantum Chemistry

SN - 0020-7608

IS - 4

M1 - e25495

ER -