The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter

T. Yoshitake; K. Nagayama

doi:10.1016/j.vacuum.2004.01.051

The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter

T. Yoshitake, K. Nagayama

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

Droplet deposition has been a serious problem for film preparation by pulsed laser deposition. In this study, for metallic Fe and semiconducting Si targets, whose droplet ejections are remarkable, the droplets could be eliminated using a vane-type velocity filter. The velocity distribution for the droplets sizes was investigated. It was found that the velocity distribution of the Fe droplet had two peaks, while on the other hand, that of Si had only faster peak. The slower one is less than 10m/s and the faster one ranges between 20 and 50m/s. The droplet velocity is not significantly dependent on their size and the maximum is at most 50m/s.

Original language	English
Pages (from-to)	515-520
Number of pages	6
Journal	Vacuum
Volume	74
Issue number	3-4 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.vacuum.2004.01.051
Publication status	Published - Jun 7 2004

All Science Journal Classification (ASJC) codes

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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10.1016/j.vacuum.2004.01.051

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title = "The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter",

abstract = "Droplet deposition has been a serious problem for film preparation by pulsed laser deposition. In this study, for metallic Fe and semiconducting Si targets, whose droplet ejections are remarkable, the droplets could be eliminated using a vane-type velocity filter. The velocity distribution for the droplets sizes was investigated. It was found that the velocity distribution of the Fe droplet had two peaks, while on the other hand, that of Si had only faster peak. The slower one is less than 10m/s and the faster one ranges between 20 and 50m/s. The droplet velocity is not significantly dependent on their size and the maximum is at most 50m/s.",

author = "T. Yoshitake and K. Nagayama",

note = "Funding Information: We are grateful to Mr. N. Tatsuguchi of the Cosmo System & Co. and Mr. K. Beppu of the VI Technology & Co. for fabricating the vane-type velocity filter equipment. The film preparation using the ArF excimer laser was carried out at the Institute for Ionized Gas and Laser Research, Kyushu University. The SEM observation was made using equipment at the Center of Advanced Instrumental Analysis, Kyushu University. This work was supported by the Japan Science and Technology Corporation.",

year = "2004",

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doi = "10.1016/j.vacuum.2004.01.051",

language = "English",

volume = "74",

pages = "515--520",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Limited",

number = "3-4 SPEC. ISS.",

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T1 - The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter

AU - Yoshitake, T.

AU - Nagayama, K.

N1 - Funding Information: We are grateful to Mr. N. Tatsuguchi of the Cosmo System & Co. and Mr. K. Beppu of the VI Technology & Co. for fabricating the vane-type velocity filter equipment. The film preparation using the ArF excimer laser was carried out at the Institute for Ionized Gas and Laser Research, Kyushu University. The SEM observation was made using equipment at the Center of Advanced Instrumental Analysis, Kyushu University. This work was supported by the Japan Science and Technology Corporation.

PY - 2004/6/7

Y1 - 2004/6/7

N2 - Droplet deposition has been a serious problem for film preparation by pulsed laser deposition. In this study, for metallic Fe and semiconducting Si targets, whose droplet ejections are remarkable, the droplets could be eliminated using a vane-type velocity filter. The velocity distribution for the droplets sizes was investigated. It was found that the velocity distribution of the Fe droplet had two peaks, while on the other hand, that of Si had only faster peak. The slower one is less than 10m/s and the faster one ranges between 20 and 50m/s. The droplet velocity is not significantly dependent on their size and the maximum is at most 50m/s.

AB - Droplet deposition has been a serious problem for film preparation by pulsed laser deposition. In this study, for metallic Fe and semiconducting Si targets, whose droplet ejections are remarkable, the droplets could be eliminated using a vane-type velocity filter. The velocity distribution for the droplets sizes was investigated. It was found that the velocity distribution of the Fe droplet had two peaks, while on the other hand, that of Si had only faster peak. The slower one is less than 10m/s and the faster one ranges between 20 and 50m/s. The droplet velocity is not significantly dependent on their size and the maximum is at most 50m/s.

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DO - 10.1016/j.vacuum.2004.01.051

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SN - 0042-207X

VL - 74

SP - 515

EP - 520

JO - Vacuum

JF - Vacuum

IS - 3-4 SPEC. ISS.

ER -

The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter

Abstract

All Science Journal Classification (ASJC) codes

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