The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter

Tsuyoshi Yoshitake, K. Nagayama

    Research output: Contribution to journalArticle

    18 Citations (Scopus)

    Abstract

    Droplet deposition has been a serious problem for film preparation by pulsed laser deposition. In this study, for metallic Fe and semiconducting Si targets, whose droplet ejections are remarkable, the droplets could be eliminated using a vane-type velocity filter. The velocity distribution for the droplets sizes was investigated. It was found that the velocity distribution of the Fe droplet had two peaks, while on the other hand, that of Si had only faster peak. The slower one is less than 10m/s and the faster one ranges between 20 and 50m/s. The droplet velocity is not significantly dependent on their size and the maximum is at most 50m/s.

    Original languageEnglish
    Pages (from-to)515-520
    Number of pages6
    JournalVacuum
    Volume74
    Issue number3-4 SPEC. ISS.
    DOIs
    Publication statusPublished - Jun 7 2004

    Fingerprint

    vanes
    Laser ablation
    Velocity distribution
    Pulsed lasers
    laser ablation
    elimination
    pulsed lasers
    velocity distribution
    Vacuum
    filters
    vacuum
    ejection
    pulsed laser deposition
    preparation
    Film preparation
    Pulsed laser deposition

    All Science Journal Classification (ASJC) codes

    • Instrumentation
    • Condensed Matter Physics
    • Surfaces, Coatings and Films

    Cite this

    The velocity distribution of droplets ejected from Fe and Si targets by pulsed laser ablation in a vacuum and their elimination using a vane-type velocity filter. / Yoshitake, Tsuyoshi; Nagayama, K.

    In: Vacuum, Vol. 74, No. 3-4 SPEC. ISS., 07.06.2004, p. 515-520.

    Research output: Contribution to journalArticle

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