Abstract
Thermodynamic analyses were carried out to understand influence of lattice constraint from GaN and InN substrates on relationship between solid composition x of In x Ga 1-x N films and input mole ratio R In (=P In 0 /(P In 0 +P Ga 0 ) where P i 0 is the input partial pressure of element i) during molecular beam epitaxy. The calculated results suggest that compositional unstable region is found at small R In region for InGaN on InN while that for InGaN on GaN can be seen at large R In region at higher temperatures. This implies that InN-rich thin films are possible to form on InN substrate though it is difficult to form on GaN substrate.
Original language | English |
---|---|
Pages (from-to) | 453-457 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 216 |
Issue number | 1-4 SPEC. |
DOIs | |
Publication status | Published - Jun 30 2003 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films