Thickness dependence of microphase-separated structure of polyurethane ultrathin films

Yoshitaka Mitsui, Yusuke Uchiba, Suguru Motokucho, Ken Kojio, Mutsuhisa Furukawa

Research output: Contribution to conferencePaper

Abstract

Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in microphase separation of polyurethane ultrathin films was investigated by fourier transform infrared (FT-IR) spectroscopy x-ray photoelectron spectroscopy (XPS) and atomic forced microscopy (AFM) as a function of film thickness and hard segment content. FT-IR measurement revealed that hydrogen bonded hard segment chains orient perpendicular to the film surface for the ultrathin film (∼6 nm). The size of hard segment domains for the ultrathin film decreased with decrease in film thickness. This is due to confinement effect because the film thickness itself (∼6 nm) is much smaller than the domain size (20 nm) formed in the bulk PUEs.

Original languageEnglish
Pages4318-4319
Number of pages2
Publication statusPublished - Dec 1 2005
Externally publishedYes
Event54th SPSJ Symposium on Macromolecules - Yamagata, Japan
Duration: Sep 20 2005Sep 22 2005

Other

Other54th SPSJ Symposium on Macromolecules
CountryJapan
CityYamagata
Period9/20/059/22/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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  • Cite this

    Mitsui, Y., Uchiba, Y., Motokucho, S., Kojio, K., & Furukawa, M. (2005). Thickness dependence of microphase-separated structure of polyurethane ultrathin films. 4318-4319. Paper presented at 54th SPSJ Symposium on Macromolecules, Yamagata, Japan.