Polyurethane ultrathin films with two hard segment contents (20 and 45 wt%) were prepared onto a silicon wafer by a spin coating method. The change in microphase separation of polyurethane ultrathin films was investigated by fourier transform infrared (FT-IR) spectroscopy x-ray photoelectron spectroscopy (XPS) and atomic forced microscopy (AFM) as a function of film thickness and hard segment content. FT-IR measurement revealed that hydrogen bonded hard segment chains orient perpendicular to the film surface for the ultrathin film (∼6 nm). The size of hard segment domains for the ultrathin film decreased with decrease in film thickness. This is due to confinement effect because the film thickness itself (∼6 nm) is much smaller than the domain size (20 nm) formed in the bulk PUEs.
|Number of pages||2|
|Publication status||Published - Dec 1 2005|
|Event||54th SPSJ Symposium on Macromolecules - Yamagata, Japan|
Duration: Sep 20 2005 → Sep 22 2005
|Other||54th SPSJ Symposium on Macromolecules|
|Period||9/20/05 → 9/22/05|
All Science Journal Classification (ASJC) codes