Thickness measurements on transparent substrates based on reflection ellipsometry. I. Optical effects of high-refractive-index additional layers

Soichi Otsuki, Koji Ohta, Kaoru Tamada, Shin Ichi Wakida

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Theoretical studies were conducted for thickness measurements using transparent substrates on the external and internal reflection configurations. For three-phase systems consisting of ambient, film, and substrate, the refractive index of the substrate could be optimized to obtain the high sensitivity of an ellipsometric quantity Δ to the film thickness and the small susceptibility of Δ to errors in the incident angle. It was shown that the combination of an ordinary glass substrate and an additional dielectric layer with an appropriate layer thickness works as a synthetic high-index single substrate (SHIS). The optical effect of the combination was approximately described by use of the effective refractive index of SHIS. A method to select the refractive index of the additional layer was also given.

Original languageEnglish
Pages (from-to)5910-5918
Number of pages9
JournalApplied Optics
Volume44
Issue number28
DOIs
Publication statusPublished - Oct 1 2005
Externally publishedYes

Fingerprint

Thickness measurement
Ellipsometry
ellipsometry
Refractive index
refractivity
Substrates
Film thickness
film thickness
magnetic permeability
Glass
glass
sensitivity
configurations

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Thickness measurements on transparent substrates based on reflection ellipsometry. I. Optical effects of high-refractive-index additional layers. / Otsuki, Soichi; Ohta, Koji; Tamada, Kaoru; Wakida, Shin Ichi.

In: Applied Optics, Vol. 44, No. 28, 01.10.2005, p. 5910-5918.

Research output: Contribution to journalArticle

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