Abstract
Theoretical studies were conducted for thickness measurements using transparent substrates on the external and internal reflection configurations. For three-phase systems consisting of ambient, film, and substrate, the refractive index of the substrate could be optimized to obtain the high sensitivity of an ellipsometric quantity Δ to the film thickness and the small susceptibility of Δ to errors in the incident angle. It was shown that the combination of an ordinary glass substrate and an additional dielectric layer with an appropriate layer thickness works as a synthetic high-index single substrate (SHIS). The optical effect of the combination was approximately described by use of the effective refractive index of SHIS. A method to select the refractive index of the additional layer was also given.
| Original language | English |
|---|---|
| Pages (from-to) | 5910-5918 |
| Number of pages | 9 |
| Journal | Applied Optics |
| Volume | 44 |
| Issue number | 28 |
| DOIs | |
| Publication status | Published - Oct 1 2005 |
| Externally published | Yes |
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All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering
Cite this
Thickness measurements on transparent substrates based on reflection ellipsometry. I. Optical effects of high-refractive-index additional layers. / Otsuki, Soichi; Ohta, Koji; Tamada, Kaoru; Wakida, Shin Ichi.
In: Applied Optics, Vol. 44, No. 28, 01.10.2005, p. 5910-5918.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Thickness measurements on transparent substrates based on reflection ellipsometry. I. Optical effects of high-refractive-index additional layers
AU - Otsuki, Soichi
AU - Ohta, Koji
AU - Tamada, Kaoru
AU - Wakida, Shin Ichi
PY - 2005/10/1
Y1 - 2005/10/1
N2 - Theoretical studies were conducted for thickness measurements using transparent substrates on the external and internal reflection configurations. For three-phase systems consisting of ambient, film, and substrate, the refractive index of the substrate could be optimized to obtain the high sensitivity of an ellipsometric quantity Δ to the film thickness and the small susceptibility of Δ to errors in the incident angle. It was shown that the combination of an ordinary glass substrate and an additional dielectric layer with an appropriate layer thickness works as a synthetic high-index single substrate (SHIS). The optical effect of the combination was approximately described by use of the effective refractive index of SHIS. A method to select the refractive index of the additional layer was also given.
AB - Theoretical studies were conducted for thickness measurements using transparent substrates on the external and internal reflection configurations. For three-phase systems consisting of ambient, film, and substrate, the refractive index of the substrate could be optimized to obtain the high sensitivity of an ellipsometric quantity Δ to the film thickness and the small susceptibility of Δ to errors in the incident angle. It was shown that the combination of an ordinary glass substrate and an additional dielectric layer with an appropriate layer thickness works as a synthetic high-index single substrate (SHIS). The optical effect of the combination was approximately described by use of the effective refractive index of SHIS. A method to select the refractive index of the additional layer was also given.
UR - http://www.scopus.com/inward/record.url?scp=28044465397&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=28044465397&partnerID=8YFLogxK
U2 - 10.1364/AO.44.005910
DO - 10.1364/AO.44.005910
M3 - Article
C2 - 16231798
AN - SCOPUS:28044465397
VL - 44
SP - 5910
EP - 5918
JO - Applied Optics
JF - Applied Optics
SN - 1559-128X
IS - 28
ER -