Thin film coating of particles through the plasma process

Hung Cuong Pham, Kyo Seon Kim

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Polypropylene (PP) beads were coated with SiO x and TiO 2 single-layer films and TiO 2/SiO x doublelayer films via rotating cylindrical plasma chemical vapor deposition (PCVD). The thicknesses of the SiOx and TiO 2 single-layer films and TiO 2/SiO x double-layer films could be easily controlled by changing the deposition time. The properties of the thin films were characterized via scanning electron microscopy and energy-dispersive X-ray spectroscopy. The double layers that were spread on PP beads were found to be TiO 2/SiO 1.72. It was found that the rotating cylindrical PCVD process can be used for coating particles with single- and double-layer films.

Original languageEnglish
Pages (from-to)264-267
Number of pages4
JournalJournal of Nanoelectronics and Optoelectronics
Volume6
Issue number3
DOIs
Publication statusPublished - Aug 2011
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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