Thin film crystallinity and substrate materials in atomic graphoepitaxy of YBa2Cu3Ox

S. Miyazawa, M. Mukaida, M. Sasaura

Research output: Contribution to journalArticle

Abstract

The complexity of a-/c-axis oriented growth of YBa2Cu3Ox thin films is reviewed from the viewpoint of controlling a-axis preferred thin film growth. Perfectly c-axis in-plane-aligned a-axis oriented YBa2Cu3Ox thin films, or "pure" a-axis oriented films, can be grown on the (100) face of tetragonal K2NiF4-type substrates by template growth process. A new growth mechanism called atomic graphoepitaxy is presented as a growth model. Transmission electron microscopy reveals that the films on a (100) SrLaGaO4 substrate consist of domains surrounded by anti-phase and stacking-fault boundaries. This domain formation can be well explained by substrate surface irregularities inherent in the SrLaGaO4 crystal. The formation of defects in microstructures in "pure" a-axis oriented YBa2Cu3Ox thin films is also modeled based on our atomic graphoepitaxial growth model.

Original languageEnglish
Pages (from-to)85-96
Number of pages12
JournalActa Physica Polonica A
Volume92
Issue number1
DOIs
Publication statusPublished - Jan 1 1997
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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