Thomson scattering diagnostics of an ecr processing plasma

Tadanori Sakoda, Shinji Momii, Kiichiro Uchino, Katsunori Muraoka, Mark Bowden, Mitsuo Maeda, Yoshio Manabe, Masatoshi Kitagawa, Tadashi Kimura

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

Information of electron behaviour in processing plasmas was obtained for the first time by the Thomson scattering measurements of electron cyclotron resonance (ECR) plasmas after overcoming various difficulties of the experiment. At relatively high microwave power of 500 W and high argon gas pressure of 2 mTorr, the measurements yielded electron temperature and density to be 9±3 eV and (9±2) x 1017 m-3, respectively. Ways of improving detection limit and/or accuracy are discussed.

Original languageEnglish
Pages (from-to)L1425-L1427
JournalJapanese journal of applied physics
Volume30
Issue number8
DOIs
Publication statusPublished - Aug 1991

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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