TY - JOUR
T1 - Thomson scattering diagnostics of an ecr processing plasma
AU - Sakoda, Tadanori
AU - Momii, Shinji
AU - Uchino, Kiichiro
AU - Muraoka, Katsunori
AU - Bowden, Mark
AU - Maeda, Mitsuo
AU - Manabe, Yoshio
AU - Kitagawa, Masatoshi
AU - Kimura, Tadashi
PY - 1991/8
Y1 - 1991/8
N2 - Information of electron behaviour in processing plasmas was obtained for the first time by the Thomson scattering measurements of electron cyclotron resonance (ECR) plasmas after overcoming various difficulties of the experiment. At relatively high microwave power of 500 W and high argon gas pressure of 2 mTorr, the measurements yielded electron temperature and density to be 9±3 eV and (9±2) x 1017 m-3, respectively. Ways of improving detection limit and/or accuracy are discussed.
AB - Information of electron behaviour in processing plasmas was obtained for the first time by the Thomson scattering measurements of electron cyclotron resonance (ECR) plasmas after overcoming various difficulties of the experiment. At relatively high microwave power of 500 W and high argon gas pressure of 2 mTorr, the measurements yielded electron temperature and density to be 9±3 eV and (9±2) x 1017 m-3, respectively. Ways of improving detection limit and/or accuracy are discussed.
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U2 - 10.1143/JJAP.30.L1425
DO - 10.1143/JJAP.30.L1425
M3 - Article
AN - SCOPUS:0026204681
SN - 0021-4922
VL - 30
SP - L1425-L1427
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 8
ER -