Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources

Kentaro Tomita, Yuta Sato, Syouichi Tsukiyama, Toshiaki Eguchi, Kiichiro Uchino, Kouichiro Kouge, Hiroaki Tomuro, Tatsuya Yanagida, Yasunori Wada, Masahito Kunishima, Georg Soumagne, Takeshi Kodama, Hakaru Mizoguchi, Atsushi Sunahara, Katsunobu Nishihara

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Time-resolved two-dimensional (2D) profiles of electron density (n e ) and electron temperature (T e ) of extreme ultraviolet (EUV) lithography light source plasmas were obtained from the ion components of collective Thomson scattering (CTS) spectra. The highest EUV conversion efficiency (CE) of 4% from double pulse lasers irradiating a Sn droplet was obtained by changing their delay time. The 2D-CTS results clarified that for the highest CE condition, a hollow-like density profile was formed, i.e., the high density region existed not on the central axis but in a part with a certain radius. The 2D profile of the in-band EUV emissivity (η EUV ) was theoretically calculated using the CTS results and atomic model (Hullac code), which reproduced a directly measured EUV image reasonably well. The CTS results strongly indicated the necessity of optimizing 2D plasma profiles to improve the CE in the future.

Original languageEnglish
Article number12328
JournalScientific reports
Volume7
Issue number1
DOIs
Publication statusPublished - Dec 1 2017

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Thomson scattering
tin
light sources
lithography
electron energy
profiles
lasers
emissivity
hollow
time lag
radii
pulses
ions

All Science Journal Classification (ASJC) codes

  • General

Cite this

Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources. / Tomita, Kentaro; Sato, Yuta; Tsukiyama, Syouichi; Eguchi, Toshiaki; Uchino, Kiichiro; Kouge, Kouichiro; Tomuro, Hiroaki; Yanagida, Tatsuya; Wada, Yasunori; Kunishima, Masahito; Soumagne, Georg; Kodama, Takeshi; Mizoguchi, Hakaru; Sunahara, Atsushi; Nishihara, Katsunobu.

In: Scientific reports, Vol. 7, No. 1, 12328, 01.12.2017.

Research output: Contribution to journalArticle

Tomita, K, Sato, Y, Tsukiyama, S, Eguchi, T, Uchino, K, Kouge, K, Tomuro, H, Yanagida, T, Wada, Y, Kunishima, M, Soumagne, G, Kodama, T, Mizoguchi, H, Sunahara, A & Nishihara, K 2017, 'Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources', Scientific reports, vol. 7, no. 1, 12328. https://doi.org/10.1038/s41598-017-11685-0
Tomita, Kentaro ; Sato, Yuta ; Tsukiyama, Syouichi ; Eguchi, Toshiaki ; Uchino, Kiichiro ; Kouge, Kouichiro ; Tomuro, Hiroaki ; Yanagida, Tatsuya ; Wada, Yasunori ; Kunishima, Masahito ; Soumagne, Georg ; Kodama, Takeshi ; Mizoguchi, Hakaru ; Sunahara, Atsushi ; Nishihara, Katsunobu. / Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources. In: Scientific reports. 2017 ; Vol. 7, No. 1.
@article{e3d83b54dd334a879b36d0b6e48f8b4f,
title = "Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources",
abstract = "Time-resolved two-dimensional (2D) profiles of electron density (n e ) and electron temperature (T e ) of extreme ultraviolet (EUV) lithography light source plasmas were obtained from the ion components of collective Thomson scattering (CTS) spectra. The highest EUV conversion efficiency (CE) of 4{\%} from double pulse lasers irradiating a Sn droplet was obtained by changing their delay time. The 2D-CTS results clarified that for the highest CE condition, a hollow-like density profile was formed, i.e., the high density region existed not on the central axis but in a part with a certain radius. The 2D profile of the in-band EUV emissivity (η EUV ) was theoretically calculated using the CTS results and atomic model (Hullac code), which reproduced a directly measured EUV image reasonably well. The CTS results strongly indicated the necessity of optimizing 2D plasma profiles to improve the CE in the future.",
author = "Kentaro Tomita and Yuta Sato and Syouichi Tsukiyama and Toshiaki Eguchi and Kiichiro Uchino and Kouichiro Kouge and Hiroaki Tomuro and Tatsuya Yanagida and Yasunori Wada and Masahito Kunishima and Georg Soumagne and Takeshi Kodama and Hakaru Mizoguchi and Atsushi Sunahara and Katsunobu Nishihara",
year = "2017",
month = "12",
day = "1",
doi = "10.1038/s41598-017-11685-0",
language = "English",
volume = "7",
journal = "Scientific Reports",
issn = "2045-2322",
publisher = "Nature Publishing Group",
number = "1",

}

TY - JOUR

T1 - Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources

AU - Tomita, Kentaro

AU - Sato, Yuta

AU - Tsukiyama, Syouichi

AU - Eguchi, Toshiaki

AU - Uchino, Kiichiro

AU - Kouge, Kouichiro

AU - Tomuro, Hiroaki

AU - Yanagida, Tatsuya

AU - Wada, Yasunori

AU - Kunishima, Masahito

AU - Soumagne, Georg

AU - Kodama, Takeshi

AU - Mizoguchi, Hakaru

AU - Sunahara, Atsushi

AU - Nishihara, Katsunobu

PY - 2017/12/1

Y1 - 2017/12/1

N2 - Time-resolved two-dimensional (2D) profiles of electron density (n e ) and electron temperature (T e ) of extreme ultraviolet (EUV) lithography light source plasmas were obtained from the ion components of collective Thomson scattering (CTS) spectra. The highest EUV conversion efficiency (CE) of 4% from double pulse lasers irradiating a Sn droplet was obtained by changing their delay time. The 2D-CTS results clarified that for the highest CE condition, a hollow-like density profile was formed, i.e., the high density region existed not on the central axis but in a part with a certain radius. The 2D profile of the in-band EUV emissivity (η EUV ) was theoretically calculated using the CTS results and atomic model (Hullac code), which reproduced a directly measured EUV image reasonably well. The CTS results strongly indicated the necessity of optimizing 2D plasma profiles to improve the CE in the future.

AB - Time-resolved two-dimensional (2D) profiles of electron density (n e ) and electron temperature (T e ) of extreme ultraviolet (EUV) lithography light source plasmas were obtained from the ion components of collective Thomson scattering (CTS) spectra. The highest EUV conversion efficiency (CE) of 4% from double pulse lasers irradiating a Sn droplet was obtained by changing their delay time. The 2D-CTS results clarified that for the highest CE condition, a hollow-like density profile was formed, i.e., the high density region existed not on the central axis but in a part with a certain radius. The 2D profile of the in-band EUV emissivity (η EUV ) was theoretically calculated using the CTS results and atomic model (Hullac code), which reproduced a directly measured EUV image reasonably well. The CTS results strongly indicated the necessity of optimizing 2D plasma profiles to improve the CE in the future.

UR - http://www.scopus.com/inward/record.url?scp=85030477349&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85030477349&partnerID=8YFLogxK

U2 - 10.1038/s41598-017-11685-0

DO - 10.1038/s41598-017-11685-0

M3 - Article

C2 - 28970565

AN - SCOPUS:85030477349

VL - 7

JO - Scientific Reports

JF - Scientific Reports

SN - 2045-2322

IS - 1

M1 - 12328

ER -