Transient three-dimensional numerical computation for unsteady oxygen concentration in a silicon melt during a Czochralski process under a cusp-shaped magnetic field

Yoo Cheol Won, Koichi Kakimoto, Hiroyuki Ozoe

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24 Citations (Scopus)

Abstract

This paper presents numerical computation for the transient oxygen concentration of a silicon melt in a Czochralski process under a cusp-shaped magnetic field. Transient three-dimensional numerical calculations were carried out for two cases of Ha = 0 and 161 for Pr = 0.013, Ra = 3.92 × 105, Recr=1329, Recu = -1596 and Sc = 5.5. The SIMPLE algorithm was employed. The oxygen concentration at a fixed point has a periodic oscillation as a function of time. The local and average oxygen concentrations in the silicon melt were less with a cusp-shaped magnetic field than those without a magnetic field. The power spectral density for the oxygen concentration fluctuation was also computed.

Original languageEnglish
Pages (from-to)622-630
Number of pages9
JournalJournal of Crystal Growth
Volume233
Issue number4
DOIs
Publication statusPublished - Dec 2001

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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