Tunable metallization by assembly of metal nanoparticles in polymer thin films by photo- or electron beam lithography

Dehui Yin, Shin Horiuchi, Masamichi Morita, Atsushi Takahara

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

The technique of patterning of surfaces with metal-rich structures on micro- or nanoscales was developed by assembling metal nanoparticles into a thin film of polymer in a controllable way. Palladium (Pd) nanoparticles were incorporated into a thin film of poly(methyl methacrylate) (PMMA) using palladium (II) bis(acetylacetonato), Pd(acac)2, as a precursor vaporized in a nitrogen atmosphere. Depending upon its dose, the irradiation of a PMMA film by UV light or an electron beam (EB) enhances its reducing capability against Pd(acac)2. This dependency on dose can be used to control the formation and assembly of Pd nanoparticles. Using this technique, binary patterns consisting of metal-rich and metal-poor regions in the polymer film can be created simply by irradiating the surface of the polymer through a binary photomask. Besides the creation of binary patterns, it is also possible to create grayscale patterns where the density of Pd nanoparticles can be tuned to provide shades of gray by the use of light with continuously modulated intensity. Because the electron beam also enhances the reducing power of PMMA against Pd(acac)2, it is thus possible to obtain highly metallized films with nanoscale pattern features. The PMMA film can be selectively removed by oxygen plasma treatment or by pyrolysis. Thus, highly metallized surfaces with binary or grayscale patterns can be obtained by selective removal of the PMMA films. The metallized regions possess relatively high resistivity against CF4 plasma compared to the bare silicon surface; therefore, the metallized surface patterns can be transferred onto the underlying silicon substrate by CF4 plasma treatment. Because of the nanosize effect of metal nanoparticles, the thermal treatment at 900°C, which is significantly lower than the melting temperature of the bulk Pd, yields continuous metallic features by binding the assembled nanoparticles.

Original languageEnglish
Pages (from-to)9352-9358
Number of pages7
JournalLangmuir
Volume21
Issue number20
DOIs
Publication statusPublished - Sep 27 2005

Fingerprint

Electron beam lithography
Metal nanoparticles
Palladium
Metallizing
Polymer films
palladium
lithography
assembly
electron beams
Polymethyl Methacrylate
Thin films
nanoparticles
Polymethyl methacrylates
polymethyl methacrylate
polymers
thin films
metals
Nanoparticles
Metals
Silicon

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

Cite this

Tunable metallization by assembly of metal nanoparticles in polymer thin films by photo- or electron beam lithography. / Yin, Dehui; Horiuchi, Shin; Morita, Masamichi; Takahara, Atsushi.

In: Langmuir, Vol. 21, No. 20, 27.09.2005, p. 9352-9358.

Research output: Contribution to journalArticle

Yin, Dehui ; Horiuchi, Shin ; Morita, Masamichi ; Takahara, Atsushi. / Tunable metallization by assembly of metal nanoparticles in polymer thin films by photo- or electron beam lithography. In: Langmuir. 2005 ; Vol. 21, No. 20. pp. 9352-9358.
@article{c3725640686743678a5822bb860d416c,
title = "Tunable metallization by assembly of metal nanoparticles in polymer thin films by photo- or electron beam lithography",
abstract = "The technique of patterning of surfaces with metal-rich structures on micro- or nanoscales was developed by assembling metal nanoparticles into a thin film of polymer in a controllable way. Palladium (Pd) nanoparticles were incorporated into a thin film of poly(methyl methacrylate) (PMMA) using palladium (II) bis(acetylacetonato), Pd(acac)2, as a precursor vaporized in a nitrogen atmosphere. Depending upon its dose, the irradiation of a PMMA film by UV light or an electron beam (EB) enhances its reducing capability against Pd(acac)2. This dependency on dose can be used to control the formation and assembly of Pd nanoparticles. Using this technique, binary patterns consisting of metal-rich and metal-poor regions in the polymer film can be created simply by irradiating the surface of the polymer through a binary photomask. Besides the creation of binary patterns, it is also possible to create grayscale patterns where the density of Pd nanoparticles can be tuned to provide shades of gray by the use of light with continuously modulated intensity. Because the electron beam also enhances the reducing power of PMMA against Pd(acac)2, it is thus possible to obtain highly metallized films with nanoscale pattern features. The PMMA film can be selectively removed by oxygen plasma treatment or by pyrolysis. Thus, highly metallized surfaces with binary or grayscale patterns can be obtained by selective removal of the PMMA films. The metallized regions possess relatively high resistivity against CF4 plasma compared to the bare silicon surface; therefore, the metallized surface patterns can be transferred onto the underlying silicon substrate by CF4 plasma treatment. Because of the nanosize effect of metal nanoparticles, the thermal treatment at 900°C, which is significantly lower than the melting temperature of the bulk Pd, yields continuous metallic features by binding the assembled nanoparticles.",
author = "Dehui Yin and Shin Horiuchi and Masamichi Morita and Atsushi Takahara",
year = "2005",
month = "9",
day = "27",
doi = "10.1021/la0511485",
language = "English",
volume = "21",
pages = "9352--9358",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
number = "20",

}

TY - JOUR

T1 - Tunable metallization by assembly of metal nanoparticles in polymer thin films by photo- or electron beam lithography

AU - Yin, Dehui

AU - Horiuchi, Shin

AU - Morita, Masamichi

AU - Takahara, Atsushi

PY - 2005/9/27

Y1 - 2005/9/27

N2 - The technique of patterning of surfaces with metal-rich structures on micro- or nanoscales was developed by assembling metal nanoparticles into a thin film of polymer in a controllable way. Palladium (Pd) nanoparticles were incorporated into a thin film of poly(methyl methacrylate) (PMMA) using palladium (II) bis(acetylacetonato), Pd(acac)2, as a precursor vaporized in a nitrogen atmosphere. Depending upon its dose, the irradiation of a PMMA film by UV light or an electron beam (EB) enhances its reducing capability against Pd(acac)2. This dependency on dose can be used to control the formation and assembly of Pd nanoparticles. Using this technique, binary patterns consisting of metal-rich and metal-poor regions in the polymer film can be created simply by irradiating the surface of the polymer through a binary photomask. Besides the creation of binary patterns, it is also possible to create grayscale patterns where the density of Pd nanoparticles can be tuned to provide shades of gray by the use of light with continuously modulated intensity. Because the electron beam also enhances the reducing power of PMMA against Pd(acac)2, it is thus possible to obtain highly metallized films with nanoscale pattern features. The PMMA film can be selectively removed by oxygen plasma treatment or by pyrolysis. Thus, highly metallized surfaces with binary or grayscale patterns can be obtained by selective removal of the PMMA films. The metallized regions possess relatively high resistivity against CF4 plasma compared to the bare silicon surface; therefore, the metallized surface patterns can be transferred onto the underlying silicon substrate by CF4 plasma treatment. Because of the nanosize effect of metal nanoparticles, the thermal treatment at 900°C, which is significantly lower than the melting temperature of the bulk Pd, yields continuous metallic features by binding the assembled nanoparticles.

AB - The technique of patterning of surfaces with metal-rich structures on micro- or nanoscales was developed by assembling metal nanoparticles into a thin film of polymer in a controllable way. Palladium (Pd) nanoparticles were incorporated into a thin film of poly(methyl methacrylate) (PMMA) using palladium (II) bis(acetylacetonato), Pd(acac)2, as a precursor vaporized in a nitrogen atmosphere. Depending upon its dose, the irradiation of a PMMA film by UV light or an electron beam (EB) enhances its reducing capability against Pd(acac)2. This dependency on dose can be used to control the formation and assembly of Pd nanoparticles. Using this technique, binary patterns consisting of metal-rich and metal-poor regions in the polymer film can be created simply by irradiating the surface of the polymer through a binary photomask. Besides the creation of binary patterns, it is also possible to create grayscale patterns where the density of Pd nanoparticles can be tuned to provide shades of gray by the use of light with continuously modulated intensity. Because the electron beam also enhances the reducing power of PMMA against Pd(acac)2, it is thus possible to obtain highly metallized films with nanoscale pattern features. The PMMA film can be selectively removed by oxygen plasma treatment or by pyrolysis. Thus, highly metallized surfaces with binary or grayscale patterns can be obtained by selective removal of the PMMA films. The metallized regions possess relatively high resistivity against CF4 plasma compared to the bare silicon surface; therefore, the metallized surface patterns can be transferred onto the underlying silicon substrate by CF4 plasma treatment. Because of the nanosize effect of metal nanoparticles, the thermal treatment at 900°C, which is significantly lower than the melting temperature of the bulk Pd, yields continuous metallic features by binding the assembled nanoparticles.

UR - http://www.scopus.com/inward/record.url?scp=26444612278&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=26444612278&partnerID=8YFLogxK

U2 - 10.1021/la0511485

DO - 10.1021/la0511485

M3 - Article

C2 - 16171373

AN - SCOPUS:26444612278

VL - 21

SP - 9352

EP - 9358

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 20

ER -