Two Different Mechanisms Are Involved in the Extremely High-Level Benzalkonium Chloride Resistance of a Pseudomonas fluorescens Strain

Katsuhiro Nagai, Takahiro Murata, Shin Ohta, Hiroshi Zenda, Makoto Ohnishi, Tetsuya Hayashi

Research output: Contribution to journalArticlepeer-review

28 Citations (Scopus)

Abstract

A Pseudomonas fluorescens strain, PFRB, which we previously isolated as a contaminant in a batch of benzalkonium chloride (BAC) stock solution, exhibits high-level resistance, not only to BAC, but also to other cationic surfactants belonging to disinfectants classified as quaternary ammonium compounds (QACs). In this study, we analyzed the resistance mechanism of the strain to BAC and other disinfectants. We obtained results suggesting that two different mechanisms, reduced adsorption of BAC to the cell surface and an energy-dependent mechanism which is most probably an efflux system, were implicated in the high-level resistance to BAC. Reduced adsorption of BAC is likely due to the decreased negative cell surface charge of the strain. The putative efflux system seems to be unique in that it excretes only a certain range of cationic membrane-acting disinfectants belonging to QACs.

Original languageEnglish
Pages (from-to)709-715
Number of pages7
JournalMICROBIOLOGY and IMMUNOLOGY
Volume47
Issue number10
DOIs
Publication statusPublished - 2003
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Microbiology
  • Immunology
  • Virology

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