Two-dimensional spatial profile of volume fraction of nanoparticles incorporated into a-Si:H films deposited by plasma CVD

William Makoto Nakamura, Hiroomi Miyahara, Hiroshi Sato, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Using an optical-scanning method, we obtained 2-D spatial profile of deposition rate of hydrogenated amorphous silicon (a-Si:H) films deposited by a multihollow discharge plasma CVD with a high spatial resolution. From the profile, we deduced 2-D spatial profile of the volume fraction of nanoparticles incorporated into films, since nanoparticles affect optical and electronic properties of a-Si:H films.

Original languageEnglish
Pages (from-to)888-889
Number of pages2
JournalIEEE Transactions on Plasma Science
Volume36
Issue number4 PART 1
DOIs
Publication statusPublished - Aug 2008

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

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