Two-dimensional thickness measurements based on internal reflection ellipsometry

Soichi Otsuki, Kaoru Tamada, Shin Ichi Wakida

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


An imaging ellipsometer technique on internal reflection geometry that can measure the thickness distribution of a thin film possessing an assumed refractive index is described. Because a prism is used for the internal reflection geometry, it was theoretically predicted that angular derivation from the normal incidence on the prism surface affects only the ^ value by a factor of 0.97 at maximum. Measurements were carried out for an optical system of silica substrate-TiO2 layer-silica layer-protein film-air, with a thin-film array of dried protein as the sample film. Thickness of the protein films was two-dimensionally estimated only from the measured map of the A value by use of the simulated relationship between the thickness and the A value. The thickness map obtained was coincident on the whole with the results according to a mechanical scanning. The detection limit was approximately ±0.2 nm. These findings validate the optical effect of a high-index additional layer to improve the sensitivity and precision of thickness measurements of the sample film on transparent substrates.

Original languageEnglish
Pages (from-to)1410-1415
Number of pages6
JournalApplied Optics
Issue number8
Publication statusPublished - Mar 10 2005
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering


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