Ultra-fine structure of a boron-doped Ni4Mo alloy

Masahiko Yamamoto, Akira Sugiyama, Hironori Matsushima, Ryuji Uemori, Hirofumi Morikawa

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6 Citations (Scopus)

Abstract

The ultra-fine structure of domain boundaries in a boron-doped Ni4Mo alloy was investigated by atom-probe field-ion microscopy. In this paper are described: (i) the contact and discontact domain boundaries, (ii) the segregation of boron atoms to three kinds of domain boundaries: anti-phase boundary (APB), anti-parallel twin boundary (APTB) and perpendicular twin boundary (PTB), (iii) the distribution of boron atoms at each domain boundary, (iv) the segregation to a node of domain boundaries and (v) the tendency of binding of boron atoms to Mo and Ni atoms.

Original languageEnglish
Pages (from-to)322-327
Number of pages6
JournalSurface Science
Volume266
Issue number1-3
DOIs
Publication statusPublished - Apr 15 1992
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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