Abstract
To realize graphene-channel field-effect-transistors (GFETs) with unipolar behavior and high on/off current ratios, we fabricated and characterized top-gate GFETs with n-type doped SiC (n-SiC) source/drain (S/D) regions on 4H-SiC(0001) substrates. 0-2 mono-layers (MLs) of graphene were grown on a monoatomic interfacial layer called zero-layer (ZL) by vacuum annealing. The 0-2 graphene MLs on the ZL were converted into 1-3 MLs of graphene without a ZL by annealing in H2. The GFETs with n-SiC S/D regions and 1-3 MLs of graphene without a ZL showed unipolar behavior with a high on/off current ratio of 2.7 × 103.
| Original language | English |
|---|---|
| Article number | 223503 |
| Journal | Applied Physics Letters |
| Volume | 103 |
| Issue number | 22 |
| DOIs | |
| Publication status | Published - Nov 25 2013 |
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All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)
Cite this
Unipolar behavior in graphene-channel field-effect-transistors with n-type doped SiC source/drain regions. / Nagahisa, Yuichi; Harada, Yuichi; Tokumitsu, Eisuke.
In: Applied Physics Letters, Vol. 103, No. 22, 223503, 25.11.2013.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Unipolar behavior in graphene-channel field-effect-transistors with n-type doped SiC source/drain regions
AU - Nagahisa, Yuichi
AU - Harada, Yuichi
AU - Tokumitsu, Eisuke
PY - 2013/11/25
Y1 - 2013/11/25
N2 - To realize graphene-channel field-effect-transistors (GFETs) with unipolar behavior and high on/off current ratios, we fabricated and characterized top-gate GFETs with n-type doped SiC (n-SiC) source/drain (S/D) regions on 4H-SiC(0001) substrates. 0-2 mono-layers (MLs) of graphene were grown on a monoatomic interfacial layer called zero-layer (ZL) by vacuum annealing. The 0-2 graphene MLs on the ZL were converted into 1-3 MLs of graphene without a ZL by annealing in H2. The GFETs with n-SiC S/D regions and 1-3 MLs of graphene without a ZL showed unipolar behavior with a high on/off current ratio of 2.7 × 103.
AB - To realize graphene-channel field-effect-transistors (GFETs) with unipolar behavior and high on/off current ratios, we fabricated and characterized top-gate GFETs with n-type doped SiC (n-SiC) source/drain (S/D) regions on 4H-SiC(0001) substrates. 0-2 mono-layers (MLs) of graphene were grown on a monoatomic interfacial layer called zero-layer (ZL) by vacuum annealing. The 0-2 graphene MLs on the ZL were converted into 1-3 MLs of graphene without a ZL by annealing in H2. The GFETs with n-SiC S/D regions and 1-3 MLs of graphene without a ZL showed unipolar behavior with a high on/off current ratio of 2.7 × 103.
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U2 - 10.1063/1.4833755
DO - 10.1063/1.4833755
M3 - Article
VL - 103
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 22
M1 - 223503
ER -