Unveiling the mechanisms of dressed-photon-phonon etching based on hierarchical surface roughness measure

Makoto Naruse, Takashi Yatsui, Wataru Nomura, Tadashi Kawazoe, Masaki Aida, Motoichi Ohtsu

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    Dressed-photon-phonon (DPP) etching is a disruptive technology in planarizing material surfaces because it completely eliminates mechanical contact processes. However, adequate metrics for evaluating the surface roughness and the underlying physical mechanisms are still not well understood. Here, we propose a two-dimensional hierarchical surface roughness measure, inspired by the Allan variance, that represents the effectiveness of DPP etching while conserving the original two-dimensional surface topology. Also, we build a simple physical model of DPP etching that agrees well with the experimental observations, which clearly shows the involvement of the intrinsic hierarchical properties of dressed photons, or optical near-fields, in the surface processing.

    Original languageEnglish
    Article number071603
    JournalApplied Physics Letters
    Volume102
    Issue number7
    DOIs
    Publication statusPublished - Feb 18 2013

    All Science Journal Classification (ASJC) codes

    • Physics and Astronomy (miscellaneous)

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