VHF SiH4/H2 plasma characteristics with negative ions

Tsukasa Yamane; Sachiko Nakao; Yoshiaki Takeuchi; Yasuhiro Yamauchi; Hiromu Takatsuka; Hiroshi Muta; Kiichiro Uchino; Yoshinobu Kawai

doi:10.1016/j.surfcoat.2012.05.036

VHF SiH₄/H₂ plasma characteristics with negative ions

Tsukasa Yamane, Sachiko Nakao, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

Electrical Engineering Sciences

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A VHF SiH₄/H₂ plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH₄/H₂ is increased, negative ions appear and at the same time the electron temperature increases.

Original language	English
Pages (from-to)	S433-S436
Journal	Surface and Coatings Technology
Volume	228
Issue number	SUPPL.1
DOIs	https://doi.org/10.1016/j.surfcoat.2012.05.036
Publication status	Published - Aug 15 2013

All Science Journal Classification (ASJC) codes

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.surfcoat.2012.05.036

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title = "VHF SiH4/H2 plasma characteristics with negative ions",

abstract = "A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases.",

author = "Tsukasa Yamane and Sachiko Nakao and Yoshiaki Takeuchi and Yasuhiro Yamauchi and Hiromu Takatsuka and Hiroshi Muta and Kiichiro Uchino and Yoshinobu Kawai",

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T1 - VHF SiH4/H2 plasma characteristics with negative ions

AU - Yamane, Tsukasa

AU - Nakao, Sachiko

AU - Takeuchi, Yoshiaki

AU - Yamauchi, Yasuhiro

AU - Takatsuka, Hiromu

AU - Muta, Hiroshi

AU - Uchino, Kiichiro

AU - Kawai, Yoshinobu

PY - 2013/8/15

Y1 - 2013/8/15

N2 - A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases.

AB - A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases.

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U2 - 10.1016/j.surfcoat.2012.05.036

DO - 10.1016/j.surfcoat.2012.05.036

M3 - Article

AN - SCOPUS:84879793383

SN - 0257-8972

VL - 228

SP - S433-S436

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - SUPPL.1

ER -

VHF SiH₄/H₂ plasma characteristics with negative ions

Abstract

All Science Journal Classification (ASJC) codes

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