VHF SiH4/H2 plasma characteristics with negative ions

Tsukasa Yamane, Sachiko Nakao, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

Research output: Contribution to journalArticle

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Abstract

A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases.

Original languageEnglish
Pages (from-to)S433-S436
JournalSurface and Coatings Technology
Volume228
Issue numberSUPPL.1
DOIs
Publication statusPublished - Aug 15 2013

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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  • Cite this

    Yamane, T., Nakao, S., Takeuchi, Y., Yamauchi, Y., Takatsuka, H., Muta, H., Uchino, K., & Kawai, Y. (2013). VHF SiH4/H2 plasma characteristics with negative ions. Surface and Coatings Technology, 228(SUPPL.1), S433-S436. https://doi.org/10.1016/j.surfcoat.2012.05.036