A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases.
|Journal||Surface and Coatings Technology|
|Publication status||Published - Aug 15 2013|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry