VHF SiH4/H2 plasma characteristics with negative ions

Tsukasa Yamane, Sachiko Nakao, Yoshiaki Takeuchi, Yasuhiro Yamauchi, Hiromu Takatsuka, Hiroshi Muta, Kiichiro Uchino, Yoshinobu Kawai

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80MHz. The Langmuir probe characteristics indicated that when the concentration of SiH4/H2 is increased, negative ions appear and at the same time the electron temperature increases.

Original languageEnglish
JournalSurface and Coatings Technology
Volume228
Issue numberSUPPL.1
DOIs
Publication statusPublished - Aug 15 2013

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Langmuir probes
electrostatic probes
negative ions
Negative ions
Plasmas
Electron temperature
rods
electron energy
Electrodes
electrodes

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Yamane, T., Nakao, S., Takeuchi, Y., Yamauchi, Y., Takatsuka, H., Muta, H., ... Kawai, Y. (2013). VHF SiH4/H2 plasma characteristics with negative ions. Surface and Coatings Technology, 228(SUPPL.1). https://doi.org/10.1016/j.surfcoat.2012.05.036

VHF SiH4/H2 plasma characteristics with negative ions. / Yamane, Tsukasa; Nakao, Sachiko; Takeuchi, Yoshiaki; Yamauchi, Yasuhiro; Takatsuka, Hiromu; Muta, Hiroshi; Uchino, Kiichiro; Kawai, Yoshinobu.

In: Surface and Coatings Technology, Vol. 228, No. SUPPL.1, 15.08.2013.

Research output: Contribution to journalArticle

Yamane, T, Nakao, S, Takeuchi, Y, Yamauchi, Y, Takatsuka, H, Muta, H, Uchino, K & Kawai, Y 2013, 'VHF SiH4/H2 plasma characteristics with negative ions', Surface and Coatings Technology, vol. 228, no. SUPPL.1. https://doi.org/10.1016/j.surfcoat.2012.05.036
Yamane T, Nakao S, Takeuchi Y, Yamauchi Y, Takatsuka H, Muta H et al. VHF SiH4/H2 plasma characteristics with negative ions. Surface and Coatings Technology. 2013 Aug 15;228(SUPPL.1). https://doi.org/10.1016/j.surfcoat.2012.05.036
Yamane, Tsukasa ; Nakao, Sachiko ; Takeuchi, Yoshiaki ; Yamauchi, Yasuhiro ; Takatsuka, Hiromu ; Muta, Hiroshi ; Uchino, Kiichiro ; Kawai, Yoshinobu. / VHF SiH4/H2 plasma characteristics with negative ions. In: Surface and Coatings Technology. 2013 ; Vol. 228, No. SUPPL.1.
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