Visualization of active surface molecular motion in polystyrene film by scanning viscoelasticity microscopy

Keiji Tanaka; Kohsuke Hashimoto; Tisato Kajiyama; Atsushi Takahara

doi:10.1021/la034542g

Visualization of active surface molecular motion in polystyrene film by scanning viscoelasticity microscopy

Keiji Tanaka, Kohsuke Hashimoto, Tisato Kajiyama, Atsushi Takahara

Department of Applied Molecular Chemistry

Research output: Contribution to journal › Article › peer-review

50 Citations (Scopus)

Abstract

A monodisperse polystyrene (PS) film was spin-coated on a silicon wafer with native oxide layer and was in part scratched by a blade. Then, the surface modulus on a given area, in which PS and bared silicon were present, was two-dimensionally mapped as a function of temperature by scanning viscoelasticity microscopy. We visually present evidence that the PS surface started to soften up at a temperature much lower than the bulk glass transition temperature.

Original language	English
Pages (from-to)	6573-6575
Number of pages	3
Journal	Langmuir
Volume	19
Issue number	17
DOIs	https://doi.org/10.1021/la034542g
Publication status	Published - Aug 19 2003

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics
Surfaces and Interfaces
Spectroscopy
Electrochemistry

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10.1021/la034542g

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abstract = "A monodisperse polystyrene (PS) film was spin-coated on a silicon wafer with native oxide layer and was in part scratched by a blade. Then, the surface modulus on a given area, in which PS and bared silicon were present, was two-dimensionally mapped as a function of temperature by scanning viscoelasticity microscopy. We visually present evidence that the PS surface started to soften up at a temperature much lower than the bulk glass transition temperature.",

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AU - Hashimoto, Kohsuke

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AU - Takahara, Atsushi

PY - 2003/8/19

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N2 - A monodisperse polystyrene (PS) film was spin-coated on a silicon wafer with native oxide layer and was in part scratched by a blade. Then, the surface modulus on a given area, in which PS and bared silicon were present, was two-dimensionally mapped as a function of temperature by scanning viscoelasticity microscopy. We visually present evidence that the PS surface started to soften up at a temperature much lower than the bulk glass transition temperature.

AB - A monodisperse polystyrene (PS) film was spin-coated on a silicon wafer with native oxide layer and was in part scratched by a blade. Then, the surface modulus on a given area, in which PS and bared silicon were present, was two-dimensionally mapped as a function of temperature by scanning viscoelasticity microscopy. We visually present evidence that the PS surface started to soften up at a temperature much lower than the bulk glass transition temperature.

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Visualization of active surface molecular motion in polystyrene film by scanning viscoelasticity microscopy

Abstract

All Science Journal Classification (ASJC) codes

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