Visualization of plasma uniformity in dry etching using the imaging plate

Kiyoshi Arita, Masahiro Etoh, Tanemasa Asano

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Monitoring two-dimensional plasma uniformity in dry etching process by using the imaging plate has been investigated. It was found that the distribution of photostimulated- luminescence intensity of the imaging plate correlates well with the distribution of the ion density in the plasma measured with a Langmuir probe. The effect of ultraviolet light from the plasma has been investigated by covering the imaging plate with a quartz wafer. It was found that the imaging plate senses ultraviolet light from the plasma whose intensity is correlated with the ion density in the bulk plasma.

Original languageEnglish
Pages (from-to)519-522
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume16
Issue number2
Publication statusPublished - Mar 1 1998

    Fingerprint

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this