Visualization of plasma uniformity in dry etching using the imaging plate

Kiyoshi Arita, Masahiro Etoh, Tanemasa Asano

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Monitoring two-dimensional plasma uniformity in dry etching process by using the imaging plate has been investigated. It was found that the distribution of photostimulated- luminescence intensity of the imaging plate correlates well with the distribution of the ion density in the plasma measured with a Langmuir probe. The effect of ultraviolet light from the plasma has been investigated by covering the imaging plate with a quartz wafer. It was found that the imaging plate senses ultraviolet light from the plasma whose intensity is correlated with the ion density in the bulk plasma.

Original languageEnglish
Pages (from-to)519-522
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume16
Issue number2
Publication statusPublished - Mar 1 1998
Externally publishedYes

Fingerprint

Dry etching
Visualization
etching
Plasmas
Imaging techniques
ultraviolet radiation
Langmuir probes
Ions
electrostatic probes
Luminescence
Quartz
coverings
quartz
wafers
luminescence
Monitoring

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Visualization of plasma uniformity in dry etching using the imaging plate. / Arita, Kiyoshi; Etoh, Masahiro; Asano, Tanemasa.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 16, No. 2, 01.03.1998, p. 519-522.

Research output: Contribution to journalArticle

@article{bf0eaaf4f5a94785abf108943b29fec1,
title = "Visualization of plasma uniformity in dry etching using the imaging plate",
abstract = "Monitoring two-dimensional plasma uniformity in dry etching process by using the imaging plate has been investigated. It was found that the distribution of photostimulated- luminescence intensity of the imaging plate correlates well with the distribution of the ion density in the plasma measured with a Langmuir probe. The effect of ultraviolet light from the plasma has been investigated by covering the imaging plate with a quartz wafer. It was found that the imaging plate senses ultraviolet light from the plasma whose intensity is correlated with the ion density in the bulk plasma.",
author = "Kiyoshi Arita and Masahiro Etoh and Tanemasa Asano",
year = "1998",
month = "3",
day = "1",
language = "English",
volume = "16",
pages = "519--522",
journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",
issn = "0734-211X",
number = "2",

}

TY - JOUR

T1 - Visualization of plasma uniformity in dry etching using the imaging plate

AU - Arita, Kiyoshi

AU - Etoh, Masahiro

AU - Asano, Tanemasa

PY - 1998/3/1

Y1 - 1998/3/1

N2 - Monitoring two-dimensional plasma uniformity in dry etching process by using the imaging plate has been investigated. It was found that the distribution of photostimulated- luminescence intensity of the imaging plate correlates well with the distribution of the ion density in the plasma measured with a Langmuir probe. The effect of ultraviolet light from the plasma has been investigated by covering the imaging plate with a quartz wafer. It was found that the imaging plate senses ultraviolet light from the plasma whose intensity is correlated with the ion density in the bulk plasma.

AB - Monitoring two-dimensional plasma uniformity in dry etching process by using the imaging plate has been investigated. It was found that the distribution of photostimulated- luminescence intensity of the imaging plate correlates well with the distribution of the ion density in the plasma measured with a Langmuir probe. The effect of ultraviolet light from the plasma has been investigated by covering the imaging plate with a quartz wafer. It was found that the imaging plate senses ultraviolet light from the plasma whose intensity is correlated with the ion density in the bulk plasma.

UR - http://www.scopus.com/inward/record.url?scp=0004734955&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0004734955&partnerID=8YFLogxK

M3 - Article

VL - 16

SP - 519

EP - 522

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

SN - 0734-211X

IS - 2

ER -