Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser

Michiteru Yamaura; Nobuya Hayashi; Satoshi Ihara; Saburoh Satoh; Y. A.M. Chobei

doi:10.1109/PPPS.2001.1001791

Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser

Michiteru Yamaura, Nobuya Hayashi, Satoshi Ihara, Saburoh Satoh, Y. A.M. Chobei

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

This paper describes accumulation effect of charged particles using high repetition rate KrF excimer laser for the laser-triggered lightning technique. The accumulation effect was investigated by the measurement of charged particle density varying the repetition rate of the laser. The process and effect of the accumulation of charged particles were confirmed in the case of laser repetition rate of 1 kHz.

Original language	English
Title of host publication	PPPS 2001 - Pulsed Power Plasma Science 2001
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	1312-1315
Number of pages	4
Volume	2
ISBN (Electronic)	0780371208, 9780780371200
DOIs	https://doi.org/10.1109/PPPS.2001.1001791
Publication status	Published - Jan 1 2001
Externally published	Yes
Event	28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001 - Las Vegas, United States Duration: Jun 17 2001 → Jun 22 2001

Other

Other	28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001
Country	United States
City	Las Vegas
Period	6/17/01 → 6/22/01

All Science Journal Classification (ASJC) codes

Energy Engineering and Power Technology
Nuclear Energy and Engineering
Nuclear and High Energy Physics

Access to Document

10.1109/PPPS.2001.1001791

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Cite this

Yamaura, M., Hayashi, N., Ihara, S., Satoh, S., & Chobei, Y. A. M. (2001). Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. In PPPS 2001 - Pulsed Power Plasma Science 2001 (Vol. 2, pp. 1312-1315). [1001791] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PPPS.2001.1001791

Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. / Yamaura, Michiteru; Hayashi, Nobuya; Ihara, Satoshi; Satoh, Saburoh; Chobei, Y. A.M.

PPPS 2001 - Pulsed Power Plasma Science 2001. Vol. 2 Institute of Electrical and Electronics Engineers Inc., 2001. p. 1312-1315 1001791.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Yamaura, M, Hayashi, N, Ihara, S, Satoh, S & Chobei, YAM 2001, Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. in PPPS 2001 - Pulsed Power Plasma Science 2001. vol. 2, 1001791, Institute of Electrical and Electronics Engineers Inc., pp. 1312-1315, 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001, Las Vegas, United States, 6/17/01. https://doi.org/10.1109/PPPS.2001.1001791

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abstract = "This paper describes accumulation effect of charged particles using high repetition rate KrF excimer laser for the laser-triggered lightning technique. The accumulation effect was investigated by the measurement of charged particle density varying the repetition rate of the laser. The process and effect of the accumulation of charged particles were confirmed in the case of laser repetition rate of 1 kHz.",

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