Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser

Michiteru Yamaura, Nobuya Hayashi, Satoshi Ihara, Saburoh Satoh, Y. A.M. Chobei

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper describes accumulation effect of charged particles using high repetition rate KrF excimer laser for the laser-triggered lightning technique. The accumulation effect was investigated by the measurement of charged particle density varying the repetition rate of the laser. The process and effect of the accumulation of charged particles were confirmed in the case of laser repetition rate of 1 kHz.

Original languageEnglish
Title of host publicationPPPS 2001 - Pulsed Power Plasma Science 2001
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1312-1315
Number of pages4
Volume2
ISBN (Electronic)0780371208, 9780780371200
DOIs
Publication statusPublished - Jan 1 2001
Externally publishedYes
Event28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001 - Las Vegas, United States
Duration: Jun 17 2001Jun 22 2001

Other

Other28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001
CountryUnited States
CityLas Vegas
Period6/17/016/22/01

Fingerprint

Excimer lasers
Charged particles
excimer lasers
repetition
charged particles
Plasmas
Lasers
lasers
lightning
Lightning

All Science Journal Classification (ASJC) codes

  • Energy Engineering and Power Technology
  • Nuclear Energy and Engineering
  • Nuclear and High Energy Physics

Cite this

Yamaura, M., Hayashi, N., Ihara, S., Satoh, S., & Chobei, Y. A. M. (2001). Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. In PPPS 2001 - Pulsed Power Plasma Science 2001 (Vol. 2, pp. 1312-1315). [1001791] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PPPS.2001.1001791

Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. / Yamaura, Michiteru; Hayashi, Nobuya; Ihara, Satoshi; Satoh, Saburoh; Chobei, Y. A.M.

PPPS 2001 - Pulsed Power Plasma Science 2001. Vol. 2 Institute of Electrical and Electronics Engineers Inc., 2001. p. 1312-1315 1001791.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yamaura, M, Hayashi, N, Ihara, S, Satoh, S & Chobei, YAM 2001, Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. in PPPS 2001 - Pulsed Power Plasma Science 2001. vol. 2, 1001791, Institute of Electrical and Electronics Engineers Inc., pp. 1312-1315, 28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001, Las Vegas, United States, 6/17/01. https://doi.org/10.1109/PPPS.2001.1001791
Yamaura M, Hayashi N, Ihara S, Satoh S, Chobei YAM. Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. In PPPS 2001 - Pulsed Power Plasma Science 2001. Vol. 2. Institute of Electrical and Electronics Engineers Inc. 2001. p. 1312-1315. 1001791 https://doi.org/10.1109/PPPS.2001.1001791
Yamaura, Michiteru ; Hayashi, Nobuya ; Ihara, Satoshi ; Satoh, Saburoh ; Chobei, Y. A.M. / Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser. PPPS 2001 - Pulsed Power Plasma Science 2001. Vol. 2 Institute of Electrical and Electronics Engineers Inc., 2001. pp. 1312-1315
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