Wettability of plasma-treated nanocrystalline diamond films

Jason H.C. Yang, Kungen Tsutsui

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

The wetting behavior of plasma-treated nanocrystalline diamond films is studied for biocoating applications. The films are prepared from Ar-rich/N 2/CH 4 and Ar-rich/H 2/CH 4 mixtures by microwave plasma-enhanced chemical vapor deposition, and further treated by microwave hydrogen and oxygen plasma exposures separately. The hydrogen plasma treatment increases the surface roughness only slightly without a perceptible change in surface morphology and composition, and shows little improvement in wettability. In contrast, the oxygen plasma treatment produces fine protrusions and increases the oxygen concentration near the surface to ∼ 11 at.%, and then the contact angle of polar water and apolar 1-bromonaphthalene is drastically reduced from 92°and 4.7°-6.9°to almost zero degree, respectively. The extremely hydrophilic behavior of the oxygen-containing film is exclusively attributed to a great increase in the polar component of the apparent surface free energy up to ∼ 34 mJ/m 2.

Original languageEnglish
Pages (from-to)54-58
Number of pages5
JournalDiamond and Related Materials
Volume24
DOIs
Publication statusPublished - Apr 1 2012

Fingerprint

Diamond films
wettability
diamond films
Wetting
oxygen plasma
hydrogen plasma
Oxygen
Plasmas
methylidyne
microwaves
Hydrogen
Microwaves
oxygen
wetting
surface roughness
Plasma enhanced chemical vapor deposition
free energy
vapor deposition
Surface structure
Free energy

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

Cite this

Wettability of plasma-treated nanocrystalline diamond films. / Yang, Jason H.C.; Tsutsui, Kungen.

In: Diamond and Related Materials, Vol. 24, 01.04.2012, p. 54-58.

Research output: Contribution to journalArticle

@article{1ea8320de93b4464b76a9756dc5225b7,
title = "Wettability of plasma-treated nanocrystalline diamond films",
abstract = "The wetting behavior of plasma-treated nanocrystalline diamond films is studied for biocoating applications. The films are prepared from Ar-rich/N 2/CH 4 and Ar-rich/H 2/CH 4 mixtures by microwave plasma-enhanced chemical vapor deposition, and further treated by microwave hydrogen and oxygen plasma exposures separately. The hydrogen plasma treatment increases the surface roughness only slightly without a perceptible change in surface morphology and composition, and shows little improvement in wettability. In contrast, the oxygen plasma treatment produces fine protrusions and increases the oxygen concentration near the surface to ∼ 11 at.{\%}, and then the contact angle of polar water and apolar 1-bromonaphthalene is drastically reduced from 92°and 4.7°-6.9°to almost zero degree, respectively. The extremely hydrophilic behavior of the oxygen-containing film is exclusively attributed to a great increase in the polar component of the apparent surface free energy up to ∼ 34 mJ/m 2.",
author = "Yang, {Jason H.C.} and Kungen Tsutsui",
year = "2012",
month = "4",
day = "1",
doi = "10.1016/j.diamond.2011.10.023",
language = "English",
volume = "24",
pages = "54--58",
journal = "Diamond and Related Materials",
issn = "0925-9635",
publisher = "Elsevier BV",

}

TY - JOUR

T1 - Wettability of plasma-treated nanocrystalline diamond films

AU - Yang, Jason H.C.

AU - Tsutsui, Kungen

PY - 2012/4/1

Y1 - 2012/4/1

N2 - The wetting behavior of plasma-treated nanocrystalline diamond films is studied for biocoating applications. The films are prepared from Ar-rich/N 2/CH 4 and Ar-rich/H 2/CH 4 mixtures by microwave plasma-enhanced chemical vapor deposition, and further treated by microwave hydrogen and oxygen plasma exposures separately. The hydrogen plasma treatment increases the surface roughness only slightly without a perceptible change in surface morphology and composition, and shows little improvement in wettability. In contrast, the oxygen plasma treatment produces fine protrusions and increases the oxygen concentration near the surface to ∼ 11 at.%, and then the contact angle of polar water and apolar 1-bromonaphthalene is drastically reduced from 92°and 4.7°-6.9°to almost zero degree, respectively. The extremely hydrophilic behavior of the oxygen-containing film is exclusively attributed to a great increase in the polar component of the apparent surface free energy up to ∼ 34 mJ/m 2.

AB - The wetting behavior of plasma-treated nanocrystalline diamond films is studied for biocoating applications. The films are prepared from Ar-rich/N 2/CH 4 and Ar-rich/H 2/CH 4 mixtures by microwave plasma-enhanced chemical vapor deposition, and further treated by microwave hydrogen and oxygen plasma exposures separately. The hydrogen plasma treatment increases the surface roughness only slightly without a perceptible change in surface morphology and composition, and shows little improvement in wettability. In contrast, the oxygen plasma treatment produces fine protrusions and increases the oxygen concentration near the surface to ∼ 11 at.%, and then the contact angle of polar water and apolar 1-bromonaphthalene is drastically reduced from 92°and 4.7°-6.9°to almost zero degree, respectively. The extremely hydrophilic behavior of the oxygen-containing film is exclusively attributed to a great increase in the polar component of the apparent surface free energy up to ∼ 34 mJ/m 2.

UR - http://www.scopus.com/inward/record.url?scp=84858335439&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84858335439&partnerID=8YFLogxK

U2 - 10.1016/j.diamond.2011.10.023

DO - 10.1016/j.diamond.2011.10.023

M3 - Article

AN - SCOPUS:84858335439

VL - 24

SP - 54

EP - 58

JO - Diamond and Related Materials

JF - Diamond and Related Materials

SN - 0925-9635

ER -