Wettability of plasma-treated nanocrystalline diamond films

Jason H.C. Yang, Kungen Teii

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Abstract

The wetting behavior of plasma-treated nanocrystalline diamond films is studied for biocoating applications. The films are prepared from Ar-rich/N 2/CH 4 and Ar-rich/H 2/CH 4 mixtures by microwave plasma-enhanced chemical vapor deposition, and further treated by microwave hydrogen and oxygen plasma exposures separately. The hydrogen plasma treatment increases the surface roughness only slightly without a perceptible change in surface morphology and composition, and shows little improvement in wettability. In contrast, the oxygen plasma treatment produces fine protrusions and increases the oxygen concentration near the surface to ∼ 11 at.%, and then the contact angle of polar water and apolar 1-bromonaphthalene is drastically reduced from 92°and 4.7°-6.9°to almost zero degree, respectively. The extremely hydrophilic behavior of the oxygen-containing film is exclusively attributed to a great increase in the polar component of the apparent surface free energy up to ∼ 34 mJ/m 2.

Original languageEnglish
Pages (from-to)54-58
Number of pages5
JournalDiamond and Related Materials
Volume24
DOIs
Publication statusPublished - Apr 2012

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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