X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

Yuichi Setsuhara; Ken Cho; Masaharu Shiratani; Makoto Sekine; Masaru Hori; Eiji Ikenaga; Shigeaki Zaima

doi:10.1016/j.tsf.2009.11.038

X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Shigeaki Zaima

Electronic Devices

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 10¹⁸ ions/cm² was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.

Original language	English
Pages (from-to)	3555-3560
Number of pages	6
Journal	Thin Solid Films
Volume	518
Issue number	13
DOIs	https://doi.org/10.1016/j.tsf.2009.11.038
Publication status	Published - Apr 30 2010

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2009.11.038

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@article{190ea146811d48b5b8ec159ce84e2c95,

title = "X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units",

abstract = "Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 1018 ions/cm2 was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.",

author = "Yuichi Setsuhara and Ken Cho and Masaharu Shiratani and Makoto Sekine and Masaru Hori and Eiji Ikenaga and Shigeaki Zaima",

note = "Funding Information: This work was supported partly by The Global COE Program “Center of Excellence for Advanced Structural and Functional Materials Design” from the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan , and Grant-in-Aid for Cooperative Research Project of Nationwide Joint-Use Research Institutes on Development Base of Joining Technology for New Metallic Glasses and Inorganic Materials from MEXT, Japan . The synchrotron radiation experiments were performed at the SPring-8 with the approval of [Japan Synchrotron Radiation Research Institute (JASRI)] as Nanotechnology Support Project of the Ministry of Education, Culture, Sports, Science and Technology. (Proposal No. 2008B1847/ BL47XU).",

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doi = "10.1016/j.tsf.2009.11.038",

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T1 - X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

AU - Setsuhara, Yuichi

AU - Cho, Ken

AU - Shiratani, Masaharu

AU - Sekine, Makoto

AU - Hori, Masaru

AU - Ikenaga, Eiji

AU - Zaima, Shigeaki

N1 - Funding Information: This work was supported partly by The Global COE Program “Center of Excellence for Advanced Structural and Functional Materials Design” from the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan , and Grant-in-Aid for Cooperative Research Project of Nationwide Joint-Use Research Institutes on Development Base of Joining Technology for New Metallic Glasses and Inorganic Materials from MEXT, Japan . The synchrotron radiation experiments were performed at the SPring-8 with the approval of [Japan Synchrotron Radiation Research Institute (JASRI)] as Nanotechnology Support Project of the Ministry of Education, Culture, Sports, Science and Technology. (Proposal No. 2008B1847/ BL47XU).

PY - 2010/4/30

Y1 - 2010/4/30

N2 - Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 1018 ions/cm2 was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.

AB - Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 1018 ions/cm2 was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.

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VL - 518

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JO - Thin Solid Films

JF - Thin Solid Films

IS - 13

ER -

X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

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