X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

Yuichi Setsuhara, Ken Cho, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Shigeaki Zaima

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 1018 ions/cm2 was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.

Original languageEnglish
Pages (from-to)3555-3560
Number of pages6
JournalThin Solid Films
Volume518
Issue number13
DOIs
Publication statusPublished - Apr 30 2010

Fingerprint

Beam plasma interactions
Polymethyl Methacrylate
inductance
Inductance
Polymers
X ray photoelectron spectroscopy
antennas
photoelectron spectroscopy
Antennas
Plasmas
Ions
polymers
ions
x rays
Argon
argon plasma
interactions
holders
Ion bombardment
sheaths

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units. / Setsuhara, Yuichi; Cho, Ken; Shiratani, Masaharu; Sekine, Makoto; Hori, Masaru; Ikenaga, Eiji; Zaima, Shigeaki.

In: Thin Solid Films, Vol. 518, No. 13, 30.04.2010, p. 3555-3560.

Research output: Contribution to journalArticle

Setsuhara, Yuichi ; Cho, Ken ; Shiratani, Masaharu ; Sekine, Makoto ; Hori, Masaru ; Ikenaga, Eiji ; Zaima, Shigeaki. / X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units. In: Thin Solid Films. 2010 ; Vol. 518, No. 13. pp. 3555-3560.
@article{190ea146811d48b5b8ec159ce84e2c95,
title = "X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units",
abstract = "Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 1018 ions/cm2 was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.",
author = "Yuichi Setsuhara and Ken Cho and Masaharu Shiratani and Makoto Sekine and Masaru Hori and Eiji Ikenaga and Shigeaki Zaima",
year = "2010",
month = "4",
day = "30",
doi = "10.1016/j.tsf.2009.11.038",
language = "English",
volume = "518",
pages = "3555--3560",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "13",

}

TY - JOUR

T1 - X-ray photoelectron spectroscopy for analysis of plasma-polymer interactions in Ar plasmas sustained via RF inductive coupling with low-inductance antenna units

AU - Setsuhara, Yuichi

AU - Cho, Ken

AU - Shiratani, Masaharu

AU - Sekine, Makoto

AU - Hori, Masaru

AU - Ikenaga, Eiji

AU - Zaima, Shigeaki

PY - 2010/4/30

Y1 - 2010/4/30

N2 - Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 1018 ions/cm2 was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.

AB - Plasma-polymer interactions have been investigated on the basis of hard X-ray photoelectron spectroscopy (HXPES) together with conventional X-ray photoelectron spectroscopy (XPS) for analysis of chemical bonding states in the surface nano-layers of polymethylmethacrylate (PMMA) films, which were exposed to argon plasmas sustained via RF inductive coupling with multiple low-inductance antenna units. The PMMA films were exposed to argon plasmas on a water-cooled substrate holder. Average ion energies bombarding onto PMMA films were varied in the range of 6-16 eV, which were evaluated as ion kinetic energies at the sheath edge to the ground potential using a mass-separated ion-energy analyzer. The etching of PMMA surface after Ar plasma exposure with an ion dose of 3.4 × 1018 ions/cm2 was measured to be insignificant (less than 20 nm). Surface roughness of PMMA slightly increased from 0.3 nm to 0.4 nm with increasing ion bombardment energy from 6 eV to 16 eV. HXPES was carried out together with conventional XPS to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) with HXPES as compared to those observed in shallower regions (8 nm) with the conventional XPS.

UR - http://www.scopus.com/inward/record.url?scp=77949442344&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77949442344&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2009.11.038

DO - 10.1016/j.tsf.2009.11.038

M3 - Article

AN - SCOPUS:77949442344

VL - 518

SP - 3555

EP - 3560

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 13

ER -