X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profiling

T. Miyayama; N. Sanada; M. Suzuki; J. S. Hammond; S. Q.D. Si; A. Takahara

doi:10.1116/1.3336242

X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profiling

T. Miyayama, N. Sanada, M. Suzuki, J. S. Hammond, S. Q.D. Si, A. Takahara

Department of Applied Molecular Chemistry

Research output: Contribution to journal › Article › peer-review

49 Citations (Scopus)

Abstract

X-ray photoelectron spectroscopy depth profiling of polyimide thin films on silicon substrates using an Ar cluster ion beam results in an extremely low degradation of the polyimide chemistry. In the range from 2.5 to 20 kV, a lower cluster ion energy produces a lower sputter induced damage to the polymer and results in an improved polyimide to silicon interface width. The sputtering rates of the polyimide are found to increase exponentially with an increase in the Ar cluster ion energy.

Original language	English
Pages (from-to)	L1-L4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	28
Issue number	2
DOIs	https://doi.org/10.1116/1.3336242
Publication status	Published - Mar 19 2010

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1116/1.3336242

Cite this

@article{1bf9f3ddb58344feba1504853460e317,

title = "X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profiling",

abstract = "X-ray photoelectron spectroscopy depth profiling of polyimide thin films on silicon substrates using an Ar cluster ion beam results in an extremely low degradation of the polyimide chemistry. In the range from 2.5 to 20 kV, a lower cluster ion energy produces a lower sputter induced damage to the polymer and results in an improved polyimide to silicon interface width. The sputtering rates of the polyimide are found to increase exponentially with an increase in the Ar cluster ion energy.",

author = "T. Miyayama and N. Sanada and M. Suzuki and Hammond, {J. S.} and Si, {S. Q.D.} and A. Takahara",

year = "2010",

month = mar,

day = "19",

doi = "10.1116/1.3336242",

language = "English",

volume = "28",

pages = "L1--L4",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "2",

}

TY - JOUR

T1 - X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profiling

AU - Miyayama, T.

AU - Sanada, N.

AU - Suzuki, M.

AU - Hammond, J. S.

AU - Si, S. Q.D.

AU - Takahara, A.

PY - 2010/3/19

Y1 - 2010/3/19

N2 - X-ray photoelectron spectroscopy depth profiling of polyimide thin films on silicon substrates using an Ar cluster ion beam results in an extremely low degradation of the polyimide chemistry. In the range from 2.5 to 20 kV, a lower cluster ion energy produces a lower sputter induced damage to the polymer and results in an improved polyimide to silicon interface width. The sputtering rates of the polyimide are found to increase exponentially with an increase in the Ar cluster ion energy.

AB - X-ray photoelectron spectroscopy depth profiling of polyimide thin films on silicon substrates using an Ar cluster ion beam results in an extremely low degradation of the polyimide chemistry. In the range from 2.5 to 20 kV, a lower cluster ion energy produces a lower sputter induced damage to the polymer and results in an improved polyimide to silicon interface width. The sputtering rates of the polyimide are found to increase exponentially with an increase in the Ar cluster ion energy.

UR - http://www.scopus.com/inward/record.url?scp=77949409366&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77949409366&partnerID=8YFLogxK

U2 - 10.1116/1.3336242

DO - 10.1116/1.3336242

M3 - Article

AN - SCOPUS:77949409366

SN - 0734-2101

VL - 28

SP - L1-L4

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

IS - 2

ER -

X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profiling

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this