研究成果 1994 2020

フィルター
記事
2020

Mechanical properties and microstructure of Yb2SiO5 environmental barrier coatings under isothermal heat treatment

Jang, B. K., Nagashima, N., Kim, S., Oh, Y. S., Lee, S. M. & Kim, H. T., 1 1 2020, (受理済み/印刷中) : : Journal of the European Ceramic Society.

研究成果: ジャーナルへの寄稿記事

Heat treatment
Coatings
Mechanical properties
Microstructure
Ytterbium

Non-uniform sintering behavior during spark plasma sintering of Y2O3

Lee, J. H., Kim, B. N. & Jang, B. K., 2 15 2020, : : Ceramics International. 46, 3, p. 4030-4034 5 p.

研究成果: ジャーナルへの寄稿記事

Spark plasma sintering
Heating rate
Sintering
Microstructure
Grain growth
2019

Fabrication and characterization of asymmetric metal/Ge/metal diodes with Ge-on-insulator substrate

Maekrua, T., Goto, T., Nakae, K., Yamamoto, K., Nakashima, H. & Wang, D., 1 1 2019, : : Japanese Journal of Applied Physics. 58, SB, SBBE05.

研究成果: ジャーナルへの寄稿記事

公開
Electroluminescence
Diodes
diodes
insulators
Fabrication
公開
Field effect transistors
field effect transistors
insulators
space transportation system
Metals

Microstructural studies of core/rim structure of polycarbosilane-derived SiC consolidated by spark plasma sintering

Lee, J. H., Lee, Y., Han, Y. H., Shin, D. G., Kim, S. & Jang, B., 6 15 2019, : : Ceramics International. 45, 9, p. 12406-12410 5 p.

研究成果: ジャーナルへの寄稿記事

Spark plasma sintering
Silicon carbide
Sintering
Carbon
Powders
3 引用 (Scopus)

Polycrystalline thin-film transistors fabricated on high-mobility solid-phase-crystallized Ge on glass

Moto, K., Yamamoto, K., Imajo, T., Suemasu, T., Nakashima, H. & Toko, K., 5 27 2019, : : Applied Physics Letters. 114, 21, 212107.

研究成果: ジャーナルへの寄稿記事

公開
solid phases
transistors
glass
thin films
hole mobility
2018
3 引用 (Scopus)

Border trap evaluation for SiO2/GeO2/Ge gate stacks using deep-level transient spectroscopy

Wen, W. C., Yamamoto, K., Wang, D. & Nakashima, H., 11 28 2018, : : Journal of Applied Physics. 124, 20, 205303.

研究成果: ジャーナルへの寄稿記事

borders
metal oxide semiconductors
traps
capacitors
evaluation
1 引用 (Scopus)

Damage and wear resistance of Al2O3SiC microcomposites with hard and elastic properties

Elyas, H., Kim, T. W., Jang, B. K. & Lee, K. S., 1 2018, : : Journal of the Ceramic Society of Japan. 126, 1, p. 21-26 6 p.

研究成果: ジャーナルへの寄稿記事

wear resistance
Wear resistance
elastic properties
damage
composite materials
7 引用 (Scopus)

Electrical properties of pseudo-single-crystalline Ge films grown by Au-induced layer exchange crystallization at 250 °c

Higashi, H., Kudo, K., Yamamoto, K., Yamada, S., Kanashima, T., Tsunoda, I., Nakashima, H. & Hamaya, K., 6 7 2018, : : Journal of Applied Physics. 123, 21, 215704.

研究成果: ジャーナルへの寄稿記事

electrical properties
crystallization
transistors
contamination
leakage
7 引用 (Scopus)

Phase transformation on spark plasma sintered dense polycarbosilane-derived SiC without additive

Lee, Y., Lee, J. H., Shin, D. G., Noviyanto, A., Lee, H. M., Nishimura, T., Jang, B. K., Kwon, W. T., Kim, Y., Kim, S. & Han, Y. H., 1 15 2018, : : Scripta Materialia. 143, p. 188-190 3 p.

研究成果: ジャーナルへの寄稿記事

polycarbosilanes
sparks
Electric sparks
phase transformations
sintering
9 引用 (Scopus)

Two-step synthesis and characterization of vertically stacked SnS-WS2 and SnS-MoS2 p-n heterojunctions

Sukma Aji, A., Izumoto, M., Suenaga, K., Yamamoto, K., Nakashima, H. & Ago, H., 1 1 2018, : : Physical Chemistry Chemical Physics. 20, 2, p. 889-897 9 p.

研究成果: ジャーナルへの寄稿記事

Heterojunctions
heterojunctions
synthesis
Chemical vapor deposition
vapor deposition
1 引用 (Scopus)
trajectory control
Sputter deposition
interlayers
Nitrogen
Metals
2017
1 引用 (Scopus)

Effect of n-type doping level on direct band gap electroluminescence intensity for asymmetric metal/Ge/metal diodes

Maekura, T., Tanaka, K., Motoyama, C., Yoneda, R., Yamamoto, K., Nakashima, H. & Wang, D., 8 30 2017, : : Semiconductor Science and Technology. 32, 10, 104001.

研究成果: ジャーナルへの寄稿記事

Electroluminescence
electroluminescence
Diodes
Energy gap
Metals
4 引用 (Scopus)

Effect of post annealing on hole mobility of pseudo-single-crystalline germanium films on glass substrates

Kasahara, K., Higashi, H., Nakano, M., Nagatomi, Y., Yamamoto, K., Nakashima, H. & Hamaya, K., 11 1 2017, : : Materials Science in Semiconductor Processing. 70, p. 68-72 5 p.

研究成果: ジャーナルへの寄稿記事

Germanium
Hole mobility
hole mobility
germanium
Electric properties
4 引用 (Scopus)

Electrical properties of epitaxial Lu- or Y-doped La2O3/La2O3/Ge high-k gate-stacks

Kanashima, T., Yamashiro, R., Zenitaka, M., Yamamoto, K., Wang, D., Tadano, J., Yamada, S., Nohira, H., Nakashima, H. & Hamaya, K., 11 1 2017, : : Materials Science in Semiconductor Processing. 70, p. 260-264 5 p.

研究成果: ジャーナルへの寄稿記事

Lutetium
Germanium
lutetium
germanium
Electric properties
2 引用 (Scopus)
Field effect transistors
field effect transistors
conduction
Fabrication
space transportation system
3 引用 (Scopus)

Mechanism of mobility enhancement in Ge p-channel metal-oxide-semiconductor field-effect transistor due to introduction of Al atoms into SiO2/GeO2 gate stack

Nagatomi, Y., Tateyama, T., Tanaka, S., Wen, W. C., Sakaguchi, T., Yamamoto, K., Zhao, L., Wang, D. & Nakashima, H., 11 1 2017, : : Materials Science in Semiconductor Processing. 70, p. 246-253 8 p.

研究成果: ジャーナルへの寄稿記事

MOSFET devices
metal oxide semiconductors
field effect transistors
Annealing
Atoms
2016
1 引用 (Scopus)

Characteristics of bulk and coating in Gd2-xZr2+xO7+0.5x(x = 0.0, 0.5, 1.0) system for thermal barrier coatings

Kim, S. J., Lee, S. M., Oh, Y. S., Kim, H. T., Jang, B. K. & Kim, S., 11 2016, : : Journal of the Korean Ceramic Society. 53, 6, p. 652-658 7 p.

研究成果: ジャーナルへの寄稿記事

Thermal barrier coatings
Suspensions
Gadolinium
Zirconia
Coatings
9 引用 (Scopus)

Effect of Yb2SiO5 addition on the physical and mechanical properties of sintered mullite ceramic as an environmental barrier coating material

Feng, F. J., Jang, B. K., Park, J. Y. & Lee, K. S., 11 1 2016, : : Ceramics International. 42, 14, p. 15203-15208 6 p.

研究成果: ジャーナルへの寄稿記事

Mullite
Physical properties
Coatings
Mechanical properties
Densification
1 引用 (Scopus)

Thermal behavior and mechanical properties of Y2SiO5 environmental barrier coatings after isothermal heat treatment

Jang, B. K., Feng, F. J., Lee, K. S., García, E., Nistal, A., Nagashima, N., Kim, S., Oh, Y. S. & Kim, H. T., 12 25 2016, : : Surface and Coatings Technology. 308, p. 24-30 7 p.

研究成果: ジャーナルへの寄稿記事

heat treatment
Heat treatment
mechanical properties
coatings
Coatings
2014
15 引用 (Scopus)

Characterization of multiwalled carbon nanotube-reinforced hydroxyapatite composites consolidated by spark plasma sintering

Kim, D. Y., Han, Y. H., Lee, J. H., Kang, I. K., Jang, B. K. & Kim, S., 2014, : : BioMed Research International. 2014, 768254.

研究成果: ジャーナルへの寄稿記事

Carbon Nanotubes
Spark plasma sintering
Multiwalled carbon nanotubes (MWCN)
Durapatite
Composite materials
5 引用 (Scopus)

Control of bond coat microstructure in HVOF process for thermal barrier coatings

Myoung, S. W., Lu, Z., Jung, Y. G., Jang, B. K. & Paik, U., 12 15 2014, : : Surface and Coatings Technology. 260, p. 63-67 5 p.

研究成果: ジャーナルへの寄稿記事

Thermal barrier coatings
Hardness
coatings
microstructure
Microstructure
2 引用 (Scopus)

Effect of plasma pretreatment on thermal durability of thermal barrier coatings in cyclic thermal exposure

Myoung, S. W., Lu, Z., Jung, Y. G., Jang, B. K., Yoo, Y. S., Seo, S. M., Choi, B. G. & Jo, C. Y., 2014, : : Advances in Materials Science and Engineering. 2014, 593891.

研究成果: ジャーナルへの寄稿記事

Thermal barrier coatings
Durability
Plasmas
Air
Hot Temperature
2013
4 引用 (Scopus)

Damage and wear resistance of Al2O3-CNT nanocomposites fabricated by spark plasma sintering

Lee, K. S., Jang, B. K. & Sakka, Y., 10 2013, : : Journal of the Ceramic Society of Japan. 121, 1418, p. 867-872 6 p.

研究成果: ジャーナルへの寄稿記事

Spark plasma sintering
sparks
wear resistance
Wear resistance
Nanocomposites

Development of metal source/drain Ge-CMOS using TiN/Ge and HfGe/Ge contacts

Nakashima, H., Yamamoto, K. & Wang, D., 1 1 2013, : : ECS Transactions. 58, 9, p. 167-178 12 p.

研究成果: ジャーナルへの寄稿記事

Fabrication
Carrier mobility
Fermi level
Metals
Electrons
2 引用 (Scopus)

Effect of carbon content on the tribological behavior of TiCxN1-x films prepared by arc-vapor deposition

Nguyen, X. H., Kim, I. K., Jang, B. K. & Oh, Y. S., 12 2013, : : Journal of the Ceramic Society of Japan. 121, 1420, p. 961-967 7 p.

研究成果: ジャーナルへの寄稿記事

Vapor deposition
Carbon
arcs
vapor deposition
Carbon nitride

Fabrication of metal-nitride/Si contacts with low electron barrier height

Yamamoto, K., Asakawa, K., Wang, D. & Nakashima, H., 1 1 2013, : : ECS Transactions. 58, 9, p. 53-59 7 p.

研究成果: ジャーナルへの寄稿記事

Nitrides
Fabrication
Electrons
Metals
Sputtering
2012
16 引用 (Scopus)
MIS (semiconductors)
passivity
capacitors
spectroscopy
traps
21 引用 (Scopus)

Fabrication of TiN/Ge contact with extremely low electron barrier height

Yamamoto, K., Harada, K., Yang, H., Wang, D. & Nakashima, H., 7 1 2012, : : Japanese journal of applied physics. 51, 7 PART 1, 070208.

研究成果: ジャーナルへの寄稿記事

Leakage currents
Fabrication
fabrication
Electrons
Surface states
4 引用 (Scopus)
Hole mobility
hole mobility
Condensation
condensation
insulators
16 引用 (Scopus)

Schottky source/drain Ge metal-oxide-semiconductor field-effect transistors with directly contacted TiN/Ge and HfGe/Ge structures

Yamamoto, K., Yamanaka, T., Harada, K., Sada, T., Sakamoto, K., Kojima, S., Yang, H., Wang, D. & Nakashima, H., 5 1 2012, : : Applied Physics Express. 5, 5, 051301.

研究成果: ジャーナルへの寄稿記事

MOSFET devices
metal oxide semiconductors
field effect transistors
Sputter deposition
MOS devices
8 引用 (Scopus)

Source/drain junction fabrication for Ge metal-oxide-semiconductor field-effect transistors

Yamamoto, K., Yamanaka, T., Ueno, R., Hirayama, K., Yang, H., Wang, D. & Nakashima, H., 2 1 2012, : : Thin Solid Films. 520, 8, p. 3382-3386 5 p.

研究成果: ジャーナルへの寄稿記事

MOSFET devices
metal oxide semiconductors
field effect transistors
Leakage currents
Fabrication
2011

Defect evaluation by photoluminescence for uniaxially strained Si-On-insulator

Wang, D., Yamamoto, K., Gao, H., Yang, H. & Nakashima, H., 11 22 2011, : : Journal of the Electrochemical Society. 158, 12, p. H1221-H1224

研究成果: ジャーナルへの寄稿記事

Strain relaxation
Photoluminescence
insulators
photoluminescence
Defects
2 引用 (Scopus)

Effective passivation of defects in Ge-rich SiGe-on-insulator substrates by Al2O3 deposition and subsequent post-annealing

Yang, H., Iyota, M., Ikeura, S., Wang, D. & Nakashima, H., 6 1 2011, : : Solid-State Electronics. 60, 1, p. 128-133 6 p.

研究成果: ジャーナルへの寄稿記事

Passivation
passivity
insulators
Annealing
Defects
23 引用 (Scopus)

Fabrication of Ge metal-oxide-semiconductor capacitors with high-quality interface by ultrathin SiO2/GeO2 bilayer passivation and postmetallization annealing effect of al

Hirayama, K., Ueno, R., Iwamura, Y., Yoshino, K., Wang, D., Yang, H. & Nakashima, H., 4 1 2011, : : Japanese Journal of Applied Physics. 50, 4 PART 2, 04DA10.

研究成果: ジャーナルへの寄稿記事

Passivation
metal oxide semiconductors
passivity
capacitors
Capacitors
19 引用 (Scopus)

Fabrication of Ge-MOS capacitors with high quality interface by ultra-thin SiO2/GeO2 bi-layer passivation combined with the subsequent SiO2-depositions using magnetron sputtering

Hirayama, K., Yoshino, K., Ueno, R., Iwamura, Y., Yang, H., Wang, D. & Nakashima, H., 6 1 2011, : : Solid-State Electronics. 60, 1, p. 122-127 6 p.

研究成果: ジャーナルへの寄稿記事

MOS capacitors
Passivation
Magnetron sputtering
passivity
capacitors
30 引用 (Scopus)
MOSFET devices
Passivation
metal oxide semiconductors
passivity
field effect transistors
3 引用 (Scopus)
Strain relaxation
Electron diffraction
Membranes
Finite element method
Transmission electron microscopy
42 引用 (Scopus)

Ohmic contact formation on n-type Ge by direct deposition of TiN

Iyota, M., Yamamoto, K., Wang, D., Yang, H. & Nakashima, H., 5 9 2011, : : Applied Physics Letters. 98, 19, 192108.

研究成果: ジャーナルへの寄稿記事

electric contacts
annealing
p-n junctions
interlayers
temperature
18 引用 (Scopus)

Postmetallization annealing effect of TiN-gate Ge metal-oxide-semiconductor capacitor with ultrathin SiO2 / GeO2 bilayer passivation

Nakashima, H., Iwamura, Y., Sakamoto, K., Wang, D., Hirayama, K., Yamamoto, K. & Yang, H., 6 20 2011, : : Applied Physics Letters. 98, 25, 252102.

研究成果: ジャーナルへの寄稿記事

metal oxide semiconductors
passivity
capacitors
annealing
nitrogen atoms
16 引用 (Scopus)

Thermal conductivity of EB-PVD ZrO2-4 mol% Y2O 3 films using the laser flash method

Jang, B. K., Sakka, Y., Yamaguchi, N., Matsubara, H. & Kim, H. T., 1 21 2011, : : Journal of Alloys and Compounds. 509, 3, p. 1045-1049 5 p.

研究成果: ジャーナルへの寄稿記事

Physical vapor deposition
Thermal conductivity
Coatings
Lasers
Thermal diffusivity
2010

325 nm-laser-excited micro-photoluminescence for strained Si films

Wang, D., Yang, H., Kitamura, T. & Nakashima, H., 2 26 2010, : : Thin Solid Films. 518, 9, p. 2470-2473 4 p.

研究成果: ジャーナルへの寄稿記事

Photoluminescence
photoluminescence
Lasers
lasers
Laser excitation
10 引用 (Scopus)

Defect control by Al deposition and the subsequent post-annealing for SiGe-on-insulator substrates with different Ge fractions

Yang, H., Wang, D., Nakashima, H., Hirayama, K., Kojima, S. & Ikeura, S., 2 26 2010, : : Thin Solid Films. 518, 9, p. 2342-2345 4 p.

研究成果: ジャーナルへの寄稿記事

Personal digital assistants
insulators
Annealing
Defects
annealing
8 引用 (Scopus)

Dispersion and shortening of multi-walled carbon nanotubes by size modification

Jang, B. K. & Sakka, Y., 1 1 2010, : : Materials Transactions. 51, 1, p. 192-195 4 p.

研究成果: ジャーナルへの寄稿記事

Carbon Nanotubes
Carbon nanotubes
carbon nanotubes
Suspensions
shear

Electrical characterization of high-k gate dielectrics on Ge with HfGeN and GeO2 interlayers

Hirayama, K., Kira, W., Yoshino, K., Yang, H., Wang, D. & Nakashima, H., 2 26 2010, : : Thin Solid Films. 518, 9, p. 2505-2508 4 p.

研究成果: ジャーナルへの寄稿記事

Gate dielectrics
interlayers
Annealing
annealing
Electron cyclotron resonance
2 引用 (Scopus)
thick films
excitons
photoluminescence
penetration
lasers
Electron diffraction
finite element method
electron diffraction
membranes
Membranes
1 引用 (Scopus)

Microstructure and strain distribution in freestanding Si membrane strained by SixNy deposition

Gao, H., Ikeda, K. I., Hata, S., Nakashima, H., Wang, D. & Nakashima, H., 9 1 2010, : : Materials Science and Engineering A. 527, 24-25, p. 6633-6637 5 p.

研究成果: ジャーナルへの寄稿記事

strain distribution
membranes
Membranes
microstructure
Microstructure
3 引用 (Scopus)

Passivation of electrically active defects in Ge-Rich SiGe-on-insulator by Al2O3 deposition and subsequent post-deposition annealing

Yang, H., Iyota, M., Ikeura, S., Wang, D. & Nakashima, H., 7 1 2010, : : Applied Physics Express. 3, 7, 071302.

研究成果: ジャーナルへの寄稿記事

Passivation
passivity
insulators
Annealing
Defects
2 引用 (Scopus)

Strain distribution in freestanding Si/SixNy membranes studied by transmission electron microscopy

Gao, H., Ikeda, K. I., Hata, S., Nakashima, H., Wang, D. & Nakashima, H., 9 30 2010, : : Thin Solid Films. 518, 23, p. 6787-6791 5 p.

研究成果: ジャーナルへの寄稿記事

strain distribution
membranes
Transmission electron microscopy
Membranes
transmission electron microscopy