赤嶺大志

Assistant Professor

国立大学法人　九州大学, 固体材料物性工学

ウェブサイトhttps://hyoka.ofc.kyushu-u.ac.jp/search/details/K006627/index.html

出典: Scopus
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Hiroshi Akamineが活動している研究トピックを掘り下げます。このトピックラベルは、この研究者の研究成果に基づきます。これらがまとまってユニークなフィンガープリントを構成します。

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54 被引用数
3 h-index
14 Article
2 Conference contribution
1 Letter

Comparison of in situ SEM and TEM observations of thermoelastic martensitic transformation in TiNi shape memory alloy
Soejima, Y., Heima, A., Akamine, H., Inamura, T. & Nishida, M., 9 18 2020, In: Materials Transactions. 61, 11, p. 2107-2114 8 p.
研究成果: Contribution to journal › Article › 査読
Effect of C/O Ratio on Phase Change and Stability of Inclusions in Ti–Ni Alloys Fabricated by a Commercial Production Process
Yamashita, F., Ide, Y., Akamine, H., Ishikawa, K. & Nishida, M., 9 1 2020, In: Shape Memory and Superelasticity. 6, 3, p. 354-364 11 p.
研究成果: Contribution to journal › Article › 査読
High interfacial quality metal-oxide-semiconductor capacitor on (111) oriented 3C-SiC with Al₂O₃ interlayer and its internal charge analysis
Oka, R., Yamamoto, K., Akamine, H., Wang, D., Nakashima, H., Hishiki, S. & Kawamura, K., 4 1 2020, In: Japanese journal of applied physics. 59, SG, SGGD17.
研究成果: Contribution to journal › Article › 査読
2 被引用数 (Scopus)
Interface trap and border trap characterization for Al₂O₃/GeO_x/Ge gate stacks and influence of these traps on mobility of Ge p-MOSFET
Wen, W. C., Nagatomi, Y., Akamine, H., Yamamoto, K., Wang, D. & Nakashima, H., 6 1 2020, In: AIP Advances. 10, 6, 065119.
研究成果: Contribution to journal › Article › 査読

Open Access
1 被引用数 (Scopus)
Isothermal Martensitic Transformations in an Aged Ni-Rich Ti-Ni Alloy Containing Coherent Ti₃Ni₄ Particles
Akamine, H., Soejima, Y., Nakamura, T., Sahar, F., Fukuda, T., Kakeshita, T. & Nishida, M., 2020, In: Materials Transactions. 61, 1, p. 37-41 5 p.
研究成果: Contribution to journal › Article › 査読
1 被引用数 (Scopus)

Comparison of in situ SEM and TEM observations of thermoelastic martensitic transformation in TiNi shape memory alloy

Effect of C/O Ratio on Phase Change and Stability of Inclusions in Ti–Ni Alloys Fabricated by a Commercial Production Process

High interfacial quality metal-oxide-semiconductor capacitor on (111) oriented 3C-SiC with Al2O3 interlayer and its internal charge analysis

Interface trap and border trap characterization for Al2O3/GeOx/Ge gate stacks and influence of these traps on mobility of Ge p-MOSFET

Isothermal Martensitic Transformations in an Aged Ni-Rich Ti-Ni Alloy Containing Coherent Ti3Ni4 Particles

High interfacial quality metal-oxide-semiconductor capacitor on (111) oriented 3C-SiC with Al₂O₃ interlayer and its internal charge analysis

Interface trap and border trap characterization for Al₂O₃/GeO_x/Ge gate stacks and influence of these traps on mobility of Ge p-MOSFET

Isothermal Martensitic Transformations in an Aged Ni-Rich Ti-Ni Alloy Containing Coherent Ti₃Ni₄ Particles