Pureに変更を加えた場合、すぐここに表示されます。

研究成果 1999 2019

フィルター
2010
1 引用 (Scopus)

Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges

Koga, K., Shiratani, M. & Watanabe, Y., 10 7 2010, Industrial Plasma Technology: Applications from Environmental to Energy Technologies. Wiley-VCH, p. 247-257 11 p.

研究成果: 著書/レポートタイプへの貢献

Defect density
Amorphous silicon
Nanoparticles

Nanoblock Assembly Using Pulse RF Discharges with Amplitude Modulation

Iwashita, S., Miyata, H., Koga, K. & Shiratani, M., 10 7 2010, Industrial Plasma Technology: Applications from Environmental to Energy Technologies. Wiley-VCH, p. 377-383 7 p.

研究成果: 著書/レポートタイプへの貢献

Amplitude modulation
2008
1 引用 (Scopus)

Growth Control of Clusters in Reactive Plasmas and Application to High-Stability a-Si: H Film Deposition

Watanabe, Y., Shiratani, M. & Koga, K., 4 8 2008, Advanced Plasma Technology. Wiley - VCH Verlag GmbH & CO. KGaA, p. 227-242 16 p.

研究成果: 著書/レポートタイプへの貢献

2005

Effects of spruttering due to ion irradiation on plasma anisotropic CVD of Cu

Takenaka, K., Takeshita, M., Koga, K., Shiratani, M. & Watanabe, Y., 12 1 2005, Novel Materials Processing by Advanced Electromagnetic Energy Sources. Elsevier, p. 75-78 4 p.

研究成果: 著書/レポートタイプへの貢献

Ion bombardment
Sputtering
Chemical vapor deposition
Plasmas
ULSI circuits

Evaluation of contribution of higher-order silane radicals in silane discharges to Si-Hbond formation in a-Si: H films

Koga, K., Kaguchi, N., Shiratani, M. & Watanabe, Y., 12 1 2005, Novel Materials Processing by Advanced Electromagnetic Energy Sources. Elsevier, p. 79-82 4 p.

研究成果: 著書/レポートタイプへの貢献

Silanes
Film growth
Amorphous silicon