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Fingerprint Keisuke Yamamotoが取り組む研究トピックをご確認ください。これらのトピックラベルは、この人物の研究に基づいています。これらを共に使用することで、固有の認識が可能になります。

Engineering & Materials Science

Metals
Fabrication
MOSFET devices
Annealing
Passivation
Germanium
Electroluminescence
Energy gap
Electric properties
Diodes
Electrons
Gate dielectrics
Light emission
Oxides
Nitrides
Fermi level
Leakage currents
Deep level transient spectroscopy
Metallizing
Interface states
Substrates
Temperature
Carrier mobility
Plasmas
Oxidation
Field effect transistors
Sputter deposition
Photoluminescence
Conduction bands
Thermal diffusion
Structural properties
Sputtering
Wet etching
Defects
Strain relaxation
Electrodes
Hole mobility
Lutetium
X ray photoelectron spectroscopy
Capacitors
Ion implantation
Transistors
Dielectric films
Drain current
Optoelectronic devices
Valence bands
Doping (additives)
Current density
Bias voltage
Atoms

Physics & Astronomy

Engineering

metal oxide semiconductors
field effect transistors
annealing
electrical properties
interlayers
fabrication
transistors
hole mobility
conduction bands
MIS (semiconductors)
diodes
traps
etching
germanium diodes
electrodes
space transportation system
p-n junctions
heterojunctions

General

metals
passivity
capacitors
insulators
leakage
light emission
evaluation
thin films
fins
augmentation
electric contacts
borders
defects

Chemistry and Materials

germanium
oxides
oxidation
glass
metal nitrides
lutetium
crystallization
solid phases
nitrogen

Physics

electroluminescence
temperature
room temperature
current density
electric potential
electrons
nitrogen atoms

Aerospace Sciences

spectroscopy
photoelectron spectroscopy

Aeronautics

trajectory control

Chemical Compounds

Annealing
Germanium
Oxides
Gate dielectrics
MOSFET devices
Metals
Fabrication
Electric properties
Energy gap
Electroluminescence
Plasmas
Oxidation
Diodes
Interface states
Leakage currents
Lutetium
Sputter deposition
Temperature
Hole mobility
Deep level transient spectroscopy
Substrates
Dielectric films
Light emission
Conduction bands
Field effect transistors
Metallizing
Current density
Strain relaxation
Sputtering
X ray photoelectron spectroscopy
Bias voltage
Structural properties
Doping (additives)
Heterojunctions
Etching
Atoms
Photoluminescence
MISFET devices
Nitrogen
Passivation
Vacuum
Growth temperature
Crystalline materials
Fermi level
Yttrium
Glass
Hall mobility
Permittivity
Defects
Wet etching