Pureに変更を加えた場合、すぐここに表示されます。

研究成果 2000 2018

  • 1141 引用
  • 15 h指数
  • 84 記事
  • 28 会議での発言
  • 15 Conference article
28 引用 (Scopus)

Analysis on the effect of polysulfide electrolyte composition for higher performance of Si quantum dot-sensitized solar cells

Seo, H., Wang, Y., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 4 15 2013, : : Electrochimica Acta. 95, p. 43-47 5 p.

研究成果: ジャーナルへの寄稿記事

Polysulfides
Electrolytes
Semiconductor quantum dots
Redox reactions
Solar cells
5 引用 (Scopus)

Analysis on the photovoltaic property of Si quantum dot-sensitized solar cells

Seo, H., Ichida, D., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 2 1 2014, : : International Journal of Precision Engineering and Manufacturing. 15, 2, p. 339-343 5 p.

研究成果: ジャーナルへの寄稿記事

Semiconductor quantum dots
Solar cells
Paint
Light absorption
Chemical vapor deposition
2 引用 (Scopus)

Blue Photoluminescence of (ZnO)0.92(InN)0.08

Matsushima, K., Iwasaki, K., Miyahara, N., Yamashita, D., Seo, H., Koga, K., Shiratani, M. & Itagaki, N., 1 1 2017, : : MRS Advances. 2, 5, p. 277-282 6 p.

研究成果: ジャーナルへの寄稿記事

Photoluminescence
photoluminescence
Lattice constants
lattice parameters
room temperature
3 引用 (Scopus)

Characteristics of crystalline silicon/Si quantum dot/poly(3,4- ethylenedioxythiophene) hybrid solar cells

Uchida, G., Wang, Y., Ichida, D., Seo, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 11 1 2013, : : Japanese journal of applied physics. 52, 11 PART 2, 11NA05.

研究成果: ジャーナルへの寄稿記事

Semiconductor quantum dots
Solar cells
solar cells
quantum dots
Crystalline materials
8 引用 (Scopus)

Characteristics of photocurrent generation in the near-ultraviolet region in Si quantum-dot sensitized solar cells

Uchida, G., Sato, M., Seo, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 10 1 2013, : : Thin Solid Films. 544, p. 93-98 6 p.

研究成果: ジャーナルへの寄稿記事

Photocurrents
Semiconductor quantum dots
photocurrents
Solar cells
solar cells

Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition

Shiratani, M., Hatozaki, K., Hashimoto, Y., Kim, Y., Seo, H., Kamataki, K., Uchida, G., Itagaki, N. & Koga, K., 11 28 2012, Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012. p. 377-382 6 p. (Materials Research Society Symposium Proceedings; 巻数 1426).

研究成果: 著書/レポートタイプへの貢献会議での発言

filters
soaking
cells
Amorphous silicon
amorphous silicon
3 引用 (Scopus)

Characteristics of the plasma parameters in the fabrication of microcrystalline silicon thin films using 915 MHz ECR plasma

Ha Thang, D., Sasaki, K., Muta, H., Itagaki, N. & Kawai, Y., 5 26 2006, : : Thin Solid Films. 506-507, p. 485-488 4 p.

研究成果: ジャーナルへの寄稿記事

Microcrystalline silicon
Plasmas
Fabrication
Thin films
fabrication
18 引用 (Scopus)

Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films

Bornholdt, S., Itagaki, N., Kuwahara, K., Wulff, H., Shiratani, M. & Kersten, H., 4 1 2013, : : Plasma Sources Science and Technology. 22, 2, 025019.

研究成果: ジャーナルへの寄稿記事

thin films
probes
charge carriers
ion impact
energy

Cluster-free B-doped a-Si:H films deposited using SiH4 + B 10H14 multi-hollow discharges

Nakahara, K., Kawashima, Y., Sato, M., Matsunaga, T., Yamamoto, K., Nakamura, W. M., Yamashita, D., Matsuzaki, H., Uchida, G., Itagaki, N., Koga, K. & Shiratani, M., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 2216-2218 3 p. 5686686

研究成果: 著書/レポートタイプへの貢献会議での発言

Deposition rates
Plasma CVD
Optical band gaps
Surface reactions
Flow of gases
194 引用 (Scopus)

Combinatorial approach to thin-film transistors using multicomponent semiconductor channels: An application to amorphous oxide semiconductors in In-Ga-Zn-O system

Iwasaki, T., Itagaki, N., Den, T., Kumomi, H., Nomura, K., Kamiya, T. & Hosono, H., 6 22 2007, : : Applied Physics Letters. 90, 24, 242114.

研究成果: ジャーナルへの寄稿記事

transistors
oxides
thin films
partial pressure
specifications
12 引用 (Scopus)

Combinatorial deposition of microcrystalline silicon films using multihollow discharge plasma chemical vapor deposition

Koga, K., Matsunaga, T., Kim, Y., Nakahara, K., Yamashita, D., Matsuzaki, H., Kamataki, K., Uchida, G., Itagaki, N. & Shiratani, M., 1 1 2012, : : Japanese Journal of Applied Physics. 51, 1 PART 2, 01AD02.

研究成果: ジャーナルへの寄稿記事

Microcrystalline silicon
silicon films
plasma jets
Chemical vapor deposition
vapor deposition
9 引用 (Scopus)

Combinatorial study on In-Ga-Zn-O semiconductor films as active-channel layers for thin-film transistor

Iwasaki, T., Itagaki, N., Den, T., Kumomi, H., Nomura, K., Kamiya, T. & Hosono, H., 12 1 2006, Current and Future Trends of Functional Oxide Films. p. 80-85 6 p. (Materials Research Society Symposium Proceedings; 巻数 928).

研究成果: 著書/レポートタイプへの貢献会議での発言

Thin film transistors
Semiconductor materials
Oxygen
Argon
Chemical analysis
8 引用 (Scopus)

Comparison between silicon thin films with and without incorporating crystalline silicon nanoparticles into the film

Koga, K., Matsunaga, T., Nakamura, W. M., Nakahara, K., Kawashima, Y., Uchida, G., Kamataki, K., Itagaki, N. & Shiratani, M., 8 1 2011, : : Thin Solid Films. 519, 20, p. 6896-6898 3 p.

研究成果: ジャーナルへの寄稿記事

Silicon
Nanoparticles
Crystalline materials
Thin films
nanoparticles

Contribution of H2 plasma etching to radial profile of amount of dust particles in a divertor simulator

Tateishi, M., Koga, K., Yamashita, D., Kamataki, K., Seo, H., Itagaki, N., Shiratani, M., Ashikawa, N., Masuzaki, S., Nishimura, K. & Sagara, A., 1 1 2014, : : Journal of Physics: Conference Series. 518, 1, 012009.

研究成果: ジャーナルへの寄稿Conference article

plasma etching
simulators
dust
profiles
flakes
1 引用 (Scopus)

Contribution of ionic precursors to deposition rate of a-Si:H films fabricated by plasma CVD

Toko, S., Hashimoto, Y., Kanemitu, Y., Torigoe, Y., Seo, H., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 1 1 2014, : : Journal of Physics: Conference Series. 518, 1, 012008.

研究成果: ジャーナルへの寄稿Conference article

vapor deposition
grids
plasma jets
hollow
direct current
5 引用 (Scopus)

Control of radial density profile of nano-particles produced in reactive plasma by amplitude modulation of radio frequency discharge voltage

Kamataki, K., Koga, K., Uchida, G., Itagaki, N., Yamashita, D., Matsuzaki, H. & Shiratani, M., 11 15 2012, : : Thin Solid Films. 523, p. 76-79 4 p.

研究成果: ジャーナルへの寄稿記事

radio frequency discharge
Amplitude modulation
Plasmas
Electric potential
electric potential
1 引用 (Scopus)

Control of the electron temperature by varying the resonance zone width in ECR plasma

Itagaki, N., Muta, H., Ishii, N. & Kawai, Y., 6 1 2004, : : Thin Solid Films. 457, 1, p. 59-63 5 p.

研究成果: ジャーナルへの寄稿Conference article

Electron temperature
Microwaves
electron energy
Magnetic fields
Plasmas
5 引用 (Scopus)

Correlation between SiH2/SiH and light-induced degradation of p-i-n hydrogenated amorphous silicon solar cells

Keya, K., Kojima, T., Torigoe, Y., Toko, S., Yamashita, D., Seo, H., Itagaki, N., Koga, K. & Shiratani, M., 1 1 2016, : : Japanese Journal of Applied Physics. 55, 7S2, 07LE03.

研究成果: ジャーナルへの寄稿記事

Silicon solar cells
Amorphous silicon
amorphous silicon
Solar cells
solar cells
4 引用 (Scopus)

Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*

Kim, Y., Hatozaki, K., Hashimoto, Y., Uchida, G., Kamataki, K., Itagaki, N., Seo, H., Koga, K. & Shiratani, M., 11 1 2013, : : Japanese journal of applied physics. 52, 11 PART 2, 11NA07.

研究成果: ジャーナルへの寄稿記事

silicon films
Amorphous silicon
amorphous silicon
light emission
Volume fraction

Cross-correlation analysis of fluctuations of interactions between nanoparticles and low pressure reactive plasmas

Zhou, R., Mori, K., Ohtomo, H., Yamashita, D., Seo, H., Itagaki, N., Koga, K. & Shiratan, M., 1 1 2018, THERMEC 2018. Chandra, T., Ionescu, M., Shabadi, R., Richard, C. & Jeandin, M. (版). Trans Tech Publications Ltd, p. 2104-2108 5 p. (Materials Science Forum; 巻数 941 MSF).

研究成果: 著書/レポートタイプへの貢献会議での発言

Beam plasma interactions
cross correlation
low pressure
Nanoparticles
Plasmas
4 引用 (Scopus)

Densities and Surface Reaction Probabilities of Oxygen and Nitrogen Atoms during Sputter Deposition of ZnInON on ZnO

Matsushima, K., Ide, T., Takeda, K., Hori, M., Yamashita, D., Seo, H., Koga, K., Shiratani, M. & Itagaki, N., 2 2017, : : IEEE Transactions on Plasma Science. 45, 2, p. 323-327 5 p., 7828157.

研究成果: ジャーナルへの寄稿記事

nitrogen atoms
surface reactions
oxygen atoms
gas flow
atoms

Deposition of cluster-free b-doped hydrogenated amorphous silicon films using sih 4+b10h1 4 multi-hollow discharge plasma chemical vapor deposition

Koga, K., Nakahara, K., Kim, Y. W., Matsunaga, T., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N. & Shiratani, M., 1 1 2012, : : Japanese Journal of Applied Physics. 51, 1 PART 2, 01AD03.

研究成果: ジャーナルへの寄稿記事

silicon films
Amorphous silicon
plasma jets
amorphous silicon
Chemical vapor deposition
1 引用 (Scopus)

Deposition of cluster-free P-doped A-Si:H films using a multi-hollow discharge plasma CVD method

Nakahara, K., Kawashima, Y., Sato, M., Matsunaga, T., Yamamoto, K., Nakamura, W. M., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 12 20 2010, Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010. p. 3722-3725 4 p. 5616514. (Conference Record of the IEEE Photovoltaic Specialists Conference).

研究成果: 著書/レポートタイプへの貢献会議での発言

Plasma CVD
Deposition rates
Flow of gases
Flow rate
Defect density
2 引用 (Scopus)

Deposition of cluster-free P-doped a-Si:H films using SiH4+PH3 multi-hollow discharge plasma CVD

Koga, K., Nakahara, K., Kim, Y. W., Kawashima, Y., Matsunaga, T., Sato, M., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N. & Shiratani, M., 10 1 2011, : : Physica Status Solidi (C) Current Topics in Solid State Physics. 8, 10, p. 3013-3016 4 p.

研究成果: ジャーナルへの寄稿記事

plasma jets
hollow
vapor deposition
surface reactions
defects
3 引用 (Scopus)

Deposition of crystalline Ge nanoparticle films by high-pressure RF magnetron sputtering method

Ichida, D., Uchida, G., Seo, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 1 1 2014, : : Journal of Physics: Conference Series. 518, 1, 012002.

研究成果: ジャーナルへの寄稿Conference article

magnetron sputtering
nanoparticles
frequency shift
gas mixtures
crystallinity

Deposition profiles of microcrystalline silicon films using multi-hollow discharge plasma CVD

Matsunaga, T., Kawashima, Y., Koga, K., Nakahara, K., Nakamura, W. M., Uchida, G., Itagaki, N., Yamashita, D., Matsuzaki, H. & Shiratani, M., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 2219-2221 3 p. 5686679. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Plasma CVD
Microcrystalline silicon
Crystalline materials
Silicon
Substrates
3 引用 (Scopus)

Discharge power dependence of carbon dust flux in a divertor simulator

Nishiyama, K., Morita, Y., Uchida, G., Yamashita, D., Kamataki, K., Seo, H., Itagaki, N., Koga, K., Shiratani, M., Ashikawa, N., Masuzaki, S., Nishimura, K., Sagara, A., Bornholdt, S. & Kersten, H., 1 1 2013, : : Journal of Nuclear Materials. 438, SUPPL

研究成果: ジャーナルへの寄稿記事

simulators
Dust
Carbon
Simulators
dust
6 引用 (Scopus)

Dust particle formation due to interaction between graphite and helicon deuterium plasmas

Iwashita, S., Nishiyama, K., Uchida, G., Seo, H., Itagaki, N., Koga, K. & Shiratani, M., 1 1 2013, : : Fusion Engineering and Design. 88, 1, p. 28-32 5 p.

研究成果: ジャーナルへの寄稿記事

Helicons
Graphite
Deuterium
Beam plasma interactions
Particles (particulate matter)
15 引用 (Scopus)

Effect of nitridation of si nanoparticles on the performance of quantum-dot sensitized solar cells

Uchida, G., Yamamoto, K., Sato, M., Kawashima, Y., Nakahara, K., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 1 1 2012, : : Japanese journal of applied physics. 51, 1 PART 2, 01AD01.

研究成果: ジャーナルへの寄稿記事

Nitridation
Semiconductor quantum dots
Solar cells
solar cells
quantum dots
5 引用 (Scopus)

Effect of sulfur doped TiO2 on photovoltaic properties of dye-sensitized solar cells

Seo, H., Nam, S. H., Itagaki, N., Koga, K., Shiratani, M. & Boo, J. H., 7 1 2016, : : Electronic Materials Letters. 12, 4, p. 530-536 7 p.

研究成果: ジャーナルへの寄稿記事

Sulfur
Photocurrents
Charge transfer
Doping (additives)
Open circuit voltage
1 引用 (Scopus)

Effects of amplitude modulation of rf discharge voltage on growth of nano-particles in reactive plasmas

Kamataki, K., Miyata, H., Koga, K., Uchida, G., Itagaki, N., Yamashita, D., Matsuzaki, H. & Shiratani, M., 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 1943-1947 5 p. 5686456

研究成果: 著書/レポートタイプへの貢献会議での発言

Amplitude modulation
Plasmas
Electric potential
Plasma CVD

Effects of Ar addition on breakdown voltage in a Si(CH3) 2(OCH3)2 RF discharge

Uchida, G., Nunomutra, S., Miyata, H., Iwashita, S., Yamashita, D., Matsuzaki, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 2199-2201 3 p. 5686704. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Electric breakdown
Electron emission
Ions
Discharge (fluid mechanics)
Cathodes
9 引用 (Scopus)

Effects of cluster incorporation into hydrogenated amorphous silicon films in initial discharge phase on film stability

Toko, S., Torigoe, Y., Chen, W., Yamashita, D., Seo, H., Itagaki, N., Koga, K. & Shiratani, M., 1 1 2015, : : Thin Solid Films. 587, p. 126-131 6 p.

研究成果: ジャーナルへの寄稿記事

silicon films
Amorphous silicon
amorphous silicon
cells
Degradation
4 引用 (Scopus)

Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma chemical vapor deposition

Kim, Y., Matsunaga, T., Nakahara, K., Uchida, G., Kamataki, K., Itagaki, N., Seo, H., Koga, K. & Shiratani, M., 11 15 2012, : : Thin Solid Films. 523, p. 29-33 5 p.

研究成果: ジャーナルへの寄稿記事

Microcrystalline silicon
silicon films
Chemical vapor deposition
vapor deposition
Nanoparticles
3 引用 (Scopus)

Effects of DC substrate bias voltage on dust flux in the Large Helical Device

Koga, K., Nishiyama, K., Morita, Y., Uchida, G., Yamashita, D., Kamataki, K., Seo, H., Itagaki, N., Shiratani, M., Ashikawa, N., Masuzaki, S., Nishimura, K. & Sagara, A., 1 1 2013, : : Journal of Nuclear Materials. 438, SUPPL

研究成果: ジャーナルへの寄稿記事

Bias voltage
Dust
dust
direct current
Fluxes
4 引用 (Scopus)

Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method

Dong, X., Koga, K., Yamashita, D., Seo, H., Itagaki, N., Shiratani, M., Setsuhara, Y., Sekine, M. & Hori, M., 1 1 2016, : : Japanese Journal of Applied Physics. 55, 1, 01AA11.

研究成果: ジャーナルへの寄稿記事

Plasma CVD
Ion bombardment
Deposition rates
bombardment
vapor deposition
3 引用 (Scopus)

Effects of filter gap of cluster-eliminating filter on cluster eliminating efficiency

Hashimoto, Y., Toko, S., Yamashita, D., Seo, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 1 1 2014, : : Journal of Physics: Conference Series. 518, 1, 012007.

研究成果: ジャーナルへの寄稿Conference article

filters
film thickness
amorphous silicon
nanoparticles
hydrogen
5 引用 (Scopus)

Effects of gas flow rate on deposition rate and number of Si clusters incorporated into a-Si:H films

Toko, S., Torigoe, Y., Keya, K., Seo, H., Itagaki, N., Koga, K. & Shiratani, M., 1 1 2016, : : Japanese Journal of Applied Physics. 55, 1, 01AA19.

研究成果: ジャーナルへの寄稿記事

Deposition rates
gas flow
Flow of gases
flow velocity
Flow rate
公開
vapor deposition
gases
plasma jets
hollow
deposits
10 引用 (Scopus)

Effects of hydrogen dilution on ZnO thin films fabricated via nitrogen-mediated crystallization

Suhariadi, I., Matsushima, K., Kuwahara, K., Oshikawa, K., Yamashita, D., Seo, H., Uchida, G., Kamataki, K., Koga, K., Shiratani, M., Bornholdt, S., Kersten, H., Wulff, H. & Itagaki, N., 1 1 2013, : : Japanese journal of applied physics. 52, 1 PART2, 01AC08.

研究成果: ジャーナルへの寄稿記事

Dilution
dilution
Crystallization
crystallization
Nitrogen

Effects of morphology of buffer layers on ZnO/sapphire heteroepitaxial growth by RF magnetron sputtering

Ide, T., Matsushima, K., Shimizu, R., Yamashita, D., Seo, H., Koga, K., Shiratani, M. & Itagaki, N., 1 1 2015, : : Materials Research Society Symposium Proceedings. 1741, January, p. 41-46 6 p.

研究成果: ジャーナルへの寄稿Conference article

Aluminum Oxide
Buffer layers
Epitaxial growth
Sapphire
Magnetron sputtering

Effects of nanoparticle incorporation on properties of microcrystalline films deposited using multi-hollow discharge plasma CVD

Kim, Y., Matsunaga, T., Nakahara, K., Seo, H., Kamataki, K., Uchida, G., Itagaki, N., Koga, K. & Shiratani, M., 8 15 2013, : : Surface and Coatings Technology. 228, SUPPL.1

研究成果: ジャーナルへの寄稿記事

Plasma CVD
plasma jets
hollow
vapor deposition
Nanoparticles
12 引用 (Scopus)

Effects of nitrogen on crystal growth of sputter-deposited ZnO films for transparent conducting oxide

Suhariadi, I., Oshikawa, K., Kuwahara, K., Matsushima, K., Yamashita, D., Uchida, G., Koga, K., Shiratani, M. & Itagaki, N., 11 1 2013, : : Japanese Journal of Applied Physics. 52, 11 PART 2, 11NB03.

研究成果: ジャーナルへの寄稿記事

Crystal growth
crystal growth
Nitrogen
nitrogen
conduction
2 引用 (Scopus)

Effects of sputtering gas pressure dependence of surface morphology of ZnO films fabricated via nitrogen mediated crystallization

Iwasaki, K., Matsushima, K., Yamashita, D., Seo, H., Koga, K., Shiratani, M. & Itagaki, N., 1 1 2017, : : MRS Advances. 2, 5, p. 265-270 6 p.

研究成果: ジャーナルへの寄稿記事

Crystallization
pressure dependence
gas pressure
Surface morphology
Sputtering

Effects of sputtering pressure on (Zno)x(inn)1-x crystal film growth at 450ºc

Itagaki, N., Takeuchi, K., Miyahara, N., Imoto, K., Seo, H., Koga, K. & Shiratani, M., 1 1 2018, THERMEC 2018. Shabadi, R., Chandra, T., Ionescu, M., Jeandin, M. & Richard, C. (版). Trans Tech Publications Ltd, p. 2093-2098 6 p. (Materials Science Forum; 巻数 941 MSF).

研究成果: 著書/レポートタイプへの貢献会議での発言

Film growth
Crystal growth
Sputtering
sputtering
crystals
5 引用 (Scopus)

Electrochemical impedance analysis on the additional layers for the enhancement on the performance of dye-sensitized solar cell

Seo, H., Son, M. K., Park, S., Jeong, M., Kim, H. J., Uchida, G., Itagaki, N., Koga, K. & Shiratani, M., 3 3 2014, : : Thin Solid Films. 554, p. 122-126 5 p.

研究成果: ジャーナルへの寄稿記事

Light scattering
solar cells
dyes
impedance
Electrolytes
6 引用 (Scopus)

Electron-temperature control in 915 MHz electron cyclotron resonance plasma

Itagaki, N., Kawai, Y., Kawakami, S. & Ishii, N., 11 1 2002, : : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 20, 6, p. 1969-1973 5 p.

研究成果: ジャーナルへの寄稿記事

Electron cyclotron resonance
Electron temperature
temperature control
electron cyclotron resonance
Temperature control
46 引用 (Scopus)

Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma

Itagaki, N., Iwata, S., Muta, K., Yonesu, A., Kawakami, S., Ishii, N. & Kawai, Y., 7 1 2003, : : Thin Solid Films. 435, 1-2, p. 259-263 5 p.

研究成果: ジャーナルへの寄稿Conference article

Electron temperature
Nitrogen
dissociation
electron energy
Plasmas
2 引用 (Scopus)

Electron temperature measurement in SiH4/H2 ECR plasma produced by 915 MHz microwaves

Itagaki, N., Sasaki, K. & Kawai, Y., 5 26 2006, : : Thin Solid Films. 506-507, p. 479-484 6 p.

研究成果: ジャーナルへの寄稿記事

Electron cyclotron resonance
Electron temperature
electron cyclotron resonance
Temperature measurement
temperature measurement
1 引用 (Scopus)

Emission spectroscopy of Ar + H2 + C7H8 plasmas: C7H8 flow rate dependence and pressure dependence

Dong, X., Koga, K., Yamashita, D., Seo, H., Itagaki, N., Shiratani, M., Setsuhara, Y., Sekine, M. & Hori, M., 1 1 2014, : : Journal of Physics: Conference Series. 518, 1, 012010.

研究成果: ジャーナルへの寄稿Conference article

magnetohydrodynamic flow
pressure dependence
flow velocity
spectroscopy
toluene