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研究成果 2000 2018

  • 1141 引用
  • 15 h指数
  • 84 記事
  • 28 会議での発言
  • 15 Conference article
2010

Effects of Ar addition on breakdown voltage in a Si(CH3) 2(OCH3)2 RF discharge

Uchida, G., Nunomutra, S., Miyata, H., Iwashita, S., Yamashita, D., Matsuzaki, H., Kamataki, K., Itagaki, N., Koga, K. & Shiratani, M., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 2199-2201 3 p. 5686704. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Electric breakdown
Electron emission
Ions
Discharge (fluid mechanics)
Cathodes
1 引用 (Scopus)

Keynote speech I: Fluctuation control for plasma nanotechnologies

Shiratani, M., Koga, K., Uchida, G., Itagaki, N. & Kamataki, K., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. 5685920. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Nanotechnology
Nanostructured materials
Plasmas
Fabrication
Nanostructures
5 引用 (Scopus)

Novel fabrication method for oxide semiconductors via atomic-additive mediated crystallization

Itagaki, N., 12 1 2010, TENCON 2010 - 2010 IEEE Region 10 Conference. p. 998-1001 4 p. 5686461. (IEEE Region 10 Annual International Conference, Proceedings/TENCON).

研究成果: 著書/レポートタイプへの貢献会議での発言

Crystallization
Amorphous films
Fabrication
Oxide films
Sputtering
2 引用 (Scopus)

Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD

Kawashima, Y., Yamamoto, K., Sato, M., Nakahara, K., Matsunaga, T., Nakamura, W. M., Yamashita, D., Matsuzaki, H., Uchida, G., Kamataki, K., Itagaki, N., Koga, K., Shiratani, M. & Kondo, M., 12 20 2010, Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010. p. 3347-3351 5 p. 5617205. (Conference Record of the IEEE Photovoltaic Specialists Conference).

研究成果: 著書/レポートタイプへの貢献会議での発言

Plasma CVD
Semiconductor quantum dots
Solar cells
Nanoparticles
Current density
2009
3 引用 (Scopus)

Favorable elements for an indium-based amorphous oxide TFT channel: Study of In-X-O (X=B, Mg, Al, Si, Ti, Zn, Ga, Ge, Mo, Sn) systems

Goyal, A., Iwasaki, T., Itagaki, N., Den, T. & Kumomi, H., 2009, Transparent Conductors and Semiconductors for Optoelectronics. 巻 1109. p. 43-48 6 p.

研究成果: 著書/レポートタイプへの貢献会議での発言

Indium
Thin film transistors
Oxide films
indium
transistors
61 引用 (Scopus)

Materials, Devices, and Circuits of Transparent Amorphous-Oxide Semiconductor

Kumomi, H., Yaginuma, S., Omura, H., Goyal, A., Sato, A., Watanabe, M., Shimada, M., Kaji, N., Takahashi, K., Ofuji, M., Watanabe, T., Itagaki, N., Shimizu, H., Abe, K., Tateishi, Y., Yabuta, H., Iwasaki, T., Hayashi, R., Aiba, T. & Sano, M., 12 2009, : : IEEE/OSA Journal of Display Technology. 5, 12, p. 531-540 10 p.

研究成果: ジャーナルへの寄稿記事

Amorphous semiconductors
Thin film transistors
transistors
oxides
Networks (circuits)
2008
59 引用 (Scopus)

Zn - In - O based thin-film transistors: Compositional dependence

Itagaki, N., Iwasaki, T., Kumomi, H., Den, T., Nomura, K., Kamiya, T. & Hosono, H., 8 1 2008, : : Physica Status Solidi (A) Applications and Materials Science. 205, 8, p. 1915-1919 5 p.

研究成果: ジャーナルへの寄稿記事

Thin film transistors
transistors
thin films
saturation
Chemical analysis
2007
194 引用 (Scopus)

Combinatorial approach to thin-film transistors using multicomponent semiconductor channels: An application to amorphous oxide semiconductors in In-Ga-Zn-O system

Iwasaki, T., Itagaki, N., Den, T., Kumomi, H., Nomura, K., Kamiya, T. & Hosono, H., 6 22 2007, : : Applied Physics Letters. 90, 24, 242114.

研究成果: ジャーナルへの寄稿記事

transistors
oxides
thin films
partial pressure
specifications
11 引用 (Scopus)
Microcrystalline silicon
Glow discharges
glow discharges
Defect density
Film growth
8 引用 (Scopus)

High rate growth of high-quality microcrystalline silicon films from plasma by interconnected multi-hollow cathode

Niikura, C., Itagaki, N. & Matsuda, A., 2 26 2007, : : Surface and Coatings Technology. 201, 9-11 SPEC. ISS., p. 5463-5467 5 p.

研究成果: ジャーナルへの寄稿記事

Microcrystalline silicon
hollow cathodes
silicon films
Cathodes
Plasmas
2006
3 引用 (Scopus)

Characteristics of the plasma parameters in the fabrication of microcrystalline silicon thin films using 915 MHz ECR plasma

Ha Thang, D., Sasaki, K., Muta, H., Itagaki, N. & Kawai, Y., 5 26 2006, : : Thin Solid Films. 506-507, p. 485-488 4 p.

研究成果: ジャーナルへの寄稿記事

Microcrystalline silicon
Plasmas
Fabrication
Thin films
fabrication
9 引用 (Scopus)

Combinatorial study on In-Ga-Zn-O semiconductor films as active-channel layers for thin-film transistor

Iwasaki, T., Itagaki, N., Den, T., Kumomi, H., Nomura, K., Kamiya, T. & Hosono, H., 12 1 2006, Current and Future Trends of Functional Oxide Films. p. 80-85 6 p. (Materials Research Society Symposium Proceedings; 巻数 928).

研究成果: 著書/レポートタイプへの貢献会議での発言

Thin film transistors
Semiconductor materials
Oxygen
Argon
Chemical analysis
2 引用 (Scopus)

Electron temperature measurement in SiH4/H2 ECR plasma produced by 915 MHz microwaves

Itagaki, N., Sasaki, K. & Kawai, Y., 5 26 2006, : : Thin Solid Films. 506-507, p. 479-484 6 p.

研究成果: ジャーナルへの寄稿記事

Electron cyclotron resonance
Electron temperature
electron cyclotron resonance
Temperature measurement
temperature measurement
2005
7 引用 (Scopus)

Production of low electron temperature ECR plasma

Kawai, Y., Itagaki, N., Koga, M. & Muta, H., 4 1 2005, : : Surface and Coatings Technology. 193, 1-3 SPEC. ISS., p. 11-16 6 p.

研究成果: ジャーナルへの寄稿記事

Electron cyclotron resonance
Electron temperature
electron cyclotron resonance
electron energy
Plasmas
2004
1 引用 (Scopus)

Control of the electron temperature by varying the resonance zone width in ECR plasma

Itagaki, N., Muta, H., Ishii, N. & Kawai, Y., 6 1 2004, : : Thin Solid Films. 457, 1, p. 59-63 5 p.

研究成果: ジャーナルへの寄稿Conference article

Electron temperature
Microwaves
electron energy
Magnetic fields
Plasmas
41 引用 (Scopus)

High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma

Niikura, C., Itagaki, N., Kondo, M., Kawai, Y. & Matsuda, A., 6 1 2004, : : Thin Solid Films. 457, 1, p. 84-89 6 p.

研究成果: ジャーナルへの寄稿Conference article

Microcrystalline silicon
Glow discharges
silicon films
glow discharges
Cathodes
2003
46 引用 (Scopus)

Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma

Itagaki, N., Iwata, S., Muta, K., Yonesu, A., Kawakami, S., Ishii, N. & Kawai, Y., 7 1 2003, : : Thin Solid Films. 435, 1-2, p. 259-263 5 p.

研究成果: ジャーナルへの寄稿Conference article

Electron temperature
Nitrogen
dissociation
electron energy
Plasmas
3 引用 (Scopus)

Generation of a low-electron-temperature ECR plasma using mirror magnetic field

Muta, H., Itagaki, N., Koga, M. & Kawai, Y., 1 1 2003, : : Surface and Coatings Technology. 174-175, p. 152-156 5 p.

研究成果: ジャーナルへの寄稿記事

Electron temperature
Mirrors
Nitrogen
electron energy
Magnetic fields
11 引用 (Scopus)

Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures

Muta, H., Koga, M., Itagaki, N. & Kawai, Y., 7 1 2003, : : Surface and Coatings Technology. 171, 1-3, p. 157-161 5 p.

研究成果: ジャーナルへの寄稿記事

Electron temperature
electron energy
Plasmas
Nitrogen
nitrogen
2002
6 引用 (Scopus)

Electron-temperature control in 915 MHz electron cyclotron resonance plasma

Itagaki, N., Kawai, Y., Kawakami, S. & Ishii, N., 11 1 2002, : : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 20, 6, p. 1969-1973 5 p.

研究成果: ジャーナルへの寄稿記事

Electron cyclotron resonance
Electron temperature
temperature control
electron cyclotron resonance
Temperature control
9 引用 (Scopus)

Numerical investigation of the production mechanism of a low-temperature electron cyclotron resonance plasma

Muta, H., Itagaki, N. & Kawai, Y., 8 19 2002, : : Vacuum. 66, 3-4, p. 209-214 6 p.

研究成果: ジャーナルへの寄稿記事

Electron cyclotron resonance
Electron temperature
electron cyclotron resonance
Nitrogen
electron energy
11 引用 (Scopus)

Production of low-electron-temperature electron cyclotron resonance plasma with large area using 915 MHz microwave

Itagaki, N., Kawai, Y., Kawakami, S. & Ishii, N., 8 19 2002, : : Vacuum. 66, 3-4, p. 323-328 6 p.

研究成果: ジャーナルへの寄稿記事

Electron cyclotron resonance
Electron temperature
electron cyclotron resonance
Microwaves
electron energy
2001
5 引用 (Scopus)

Investigation of ECR plasma uniformity from the point of view of production and confinement

Itagaki, N., Yoshizawa, T., Ueda, Y. & Kawai, Y., 5 15 2001, : : Thin Solid Films. 386, 2, p. 152-159 8 p.

研究成果: ジャーナルへの寄稿Conference article

Electron cyclotron resonance
electron cyclotron resonance
Plasmas
Refraction
refraction
6 引用 (Scopus)

Production of low electron temperature ECR plasma for plasma processing

Itagaki, N., Ueda, Y., Ishii, N. & Kawai, Y., 6 30 2001, : : Thin Solid Films. 390, 1-2, p. 202-207 6 p.

研究成果: ジャーナルへの寄稿記事

Plasma applications
Electron temperature
electron energy
Plasmas
Magnetic mirrors
8 引用 (Scopus)

Production of low electron temperature ECR plasma for thin film deposition

Itagaki, N., Ueda, Y., Ishii, N. & Kawai, Y., 7 1 2001, : : Surface and Coatings Technology. 142-144, p. 546-550 5 p.

研究成果: ジャーナルへの寄稿記事

Electron cyclotron resonance
Electron temperature
electron cyclotron resonance
electron energy
Magnetic fields
8 引用 (Scopus)
Nitrogen plasma
Electron cyclotron resonance
nitrogen plasma
Electron temperature
electron cyclotron resonance
2000
18 引用 (Scopus)

Plasma parameter measurements and deposition of a-Si:H thin films in pulsed ECR plasma

Itagaki, N., Fukuda, A., Yoshizawa, T., Shindo, M., Ueda, Y. & Kawai, Y., 12 1 2000, : : Surface and Coatings Technology. 131, 1-3, p. 54-57 4 p.

研究成果: ジャーナルへの寄稿記事

Plasmas
Thin films
Pulse modulation
thin films
pulse modulation